The efficient DTCO Compact Modeling Solutions to Improve MHC and Reduce TAT

Abstract

This paper introduces the recent modeling challenges of the Process Development Kit (PDK) development due to the limitations of transistor scaling and the impact of new process technologies. And a new modeling solution, Agile PDK is presented to break though these development challenges by enabling the Design Technology Co-Optimization (DTCO) activities in the manufacturing levels. A series of advanced algorithms are newly introduced to not only reduce the PDK development time (TAT), but also improve the model accuracies and Model-to-Hardware Correlation (MHC). It is applied to the latest DRAM technology and dramatically reduces the development TAT up to 50% with improved model accuracies.