Multi-Physics Simulation Platform and Multi-Layer Metal Technology for CMOS-MEMS Accelerometer with Gold Proof Mass

K. Machida, T. Konishi, D. Yamane, H. Toshiyoshi, Hiroyuki Ito
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引用次数: 2

Abstract

This chapter describes technical features and solutions to realize a highly sensitive CMOS-MEMS accelerometer with gold proof mass. The multi-physics simulation platform for designing the CMOS-MEMS device has been developed to understand simultaneously both mechanical and electrical behaviors of MEMS stacked on LSI. MEMS accelerometer fabrication process is established by the multilayer metal technology, which consists of the gold electroplating and the photo-sensitive polyimide film. The proposed MEMS accelerometers are fabricated and evaluated to verify the effectiveness of the proposed techniques regarding sub-1G MEMS and arrayed MEMS devices. The experimental results show that the Brownian noise of the sub-1G MEMS accelerometer can achieve 780 nG/(Hz) 1/2 and the arrayed MEMS accelerometer has a wide detection, ranging from 1.0 to 20 G. Moreover, using the developed simulation platform, we demonstrate the proposed capacitive CMOS-MEMS accelerometer implemented by the multi-layer metal technology. In conclusion, it is confirmed that the multi-physics simulation platform and the multi-layer metal technology for the CMOS-MEMS device have a potential to realize a nano-gravity sensing technology.
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金质量CMOS-MEMS加速度计多物理场仿真平台及多层金属技术
本章描述了实现高灵敏度CMOS-MEMS加速度计的技术特点和解决方案。开发了用于设计CMOS-MEMS器件的多物理场仿真平台,以同时了解堆叠在LSI上的MEMS的机械和电气行为。采用多层金属技术建立了MEMS加速度计的制造工艺,该工艺由镀金和光敏聚酰亚胺膜组成。制造并评估了所提出的MEMS加速度计,以验证所提出的技术在sub-1G MEMS和阵列MEMS器件方面的有效性。实验结果表明,亚1g级MEMS加速度计的布朗噪声可达到780 nG/(Hz) 1/2,阵列式MEMS加速度计具有1.0 ~ 20g的宽检测范围。此外,利用所开发的仿真平台,我们验证了采用多层金属技术实现的电容式CMOS-MEMS加速度计。综上所述,基于多物理场仿真平台和多层金属技术的CMOS-MEMS器件具有实现纳米重力传感技术的潜力。
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