D. Kalblein, B. Fenk, K. Hahn, U. Zschieschang, K. Kern, H. Klauk
{"title":"Aluminum top-gate ZnO nanowire transistors with improved transconductance","authors":"D. Kalblein, B. Fenk, K. Hahn, U. Zschieschang, K. Kern, H. Klauk","doi":"10.1109/DRC.2011.5994518","DOIUrl":null,"url":null,"abstract":"Field-effect transistors (FETs) based on semiconducting nanowires are potentially useful to replace thin-film transistors (TFTs) in active-matrix displays, since the larger mobility and smaller footprint of nanowire FETs compared with a-Si:H and organic TFTs provide faster pixel charging and larger aperture ratio. Nanowire growth often requires high temperatures, but if the nanowires can be grown on a temperature-compatible substrate and then be transferred to the target substrate for FET fabrication, and if the temperature during FET fabrication is below ∼150 °C, nanoscale FETs can be fabricated on polymeric substrates for flexible displays.","PeriodicalId":107059,"journal":{"name":"69th Device Research Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2011-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"69th Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2011.5994518","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Field-effect transistors (FETs) based on semiconducting nanowires are potentially useful to replace thin-film transistors (TFTs) in active-matrix displays, since the larger mobility and smaller footprint of nanowire FETs compared with a-Si:H and organic TFTs provide faster pixel charging and larger aperture ratio. Nanowire growth often requires high temperatures, but if the nanowires can be grown on a temperature-compatible substrate and then be transferred to the target substrate for FET fabrication, and if the temperature during FET fabrication is below ∼150 °C, nanoscale FETs can be fabricated on polymeric substrates for flexible displays.