The influence of bias conditions upon the intrinsic noise parameters of short gate length GaAs MESFETs

S. Greaves, R. Unwin
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Abstract

For complete characterisation of the noise performance of FET type structures, such as MESFETs and HEMTs, accurate values for the device's intrinsic noise parameters are required. These parameters have been shown to be sensibly frequency independent below 30 GHz but are strongly bias dependent. The problem of accurate determination of the intrinsic noise parameters for GaAs devices is complicated by the carrier transport mechanisms that exist in such material. This is particularly true for sub-micron gate-length devices where channel field strengths are far in excess of the critical field required for velocity saturation of the carriers. As yet no analytic solution is available that can accurately predict the current dependency of the intrinsic noise parameters of such devices. Here results obtained from measured noise data are presented that show the evolution of these parameters with drain current for two practical devices.
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偏置条件对短栅长GaAs mesfet本征噪声参数的影响
为了完整地描述FET类型结构(如mesfet和hemt)的噪声性能,需要精确的器件固有噪声参数值。这些参数在30ghz以下明显与频率无关,但与偏置密切相关。由于砷化镓材料中载流子输运机制的存在,使得砷化镓器件本征噪声参数的准确测定问题变得复杂。对于亚微米栅极长度器件尤其如此,其中通道场强度远远超过载流子速度饱和所需的临界场。到目前为止,还没有解析解可以准确地预测这类器件的固有噪声参数的当前依赖关系。本文给出了实测噪声数据的结果,显示了两个实际器件的这些参数随漏极电流的变化。
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