Effects of Etching Holes on Capacitance and Tuning Range in MEMS Parallel Plate Variable Capacitors

A. Elshurafa, E. El-Masry
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引用次数: 15

Abstract

This paper presents extensive simulations of MEMS parallel plate variable capacitors with attention dedicated towards variations in etching holes' properties. For various separation distances between the plates, different hole sizes and density were created and capacitances were extracted. Within typical values, it was found that the configuration of the holes might affect the tuning range by no more than 16% at extreme cases of their theoretical counterparts. Simulations were done using finite element modeling
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蚀刻孔对微机电系统并联板可变电容器电容和调谐范围的影响
本文对微机电系统并联板可变电容器进行了广泛的仿真,重点研究了蚀刻孔特性的变化。在不同的板间距下,产生不同的孔尺寸和密度,并提取电容。在典型值内,发现在理论对应物的极端情况下,孔的配置对调谐范围的影响不超过16%。采用有限元模型进行了仿真
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