{"title":"SiGe building blocks for on-chip X-Band T/R modules","authors":"T. Dinc, S. Zihir, Y. Gurbuz","doi":"10.1109/SIRF.2012.6160132","DOIUrl":null,"url":null,"abstract":"This paper presents a T/R (transmit/receive) module for X-Band phased arrays using a 0.25 μm SiGe BiCMOS process technology. The T/R module consists of a T/R switch, a SPDT switch, a power amplifier (PA), and a low noise amplifier (LNA). The T/R switch and SPDT switch are implemented using CMOS transistors whereas the PA and LNA are based on SiGe HBTs. The designed T/R switch achieves minimum 3.2 dB insertion loss, maximum 34.8 dB isolation and has a P1dB of 28.2 dBm at 10 GHz. The SPDT switch has less than 2.2 dB loss at X-Band and occupies 0.17 mm2 chip area. The PA achieves a small-signal gain of 25 dB and a saturated output power of 23.2 dBm with 25% PAE in a 3 GHz bandwidth. Lastly, the LNA has a gain more than 19 dB and 1.65 dB (mean) noise figure at X-Band. More detailed analysis with extended results and utilized techniques will be presented at the conference.","PeriodicalId":339730,"journal":{"name":"2012 IEEE 12th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","volume":"379 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE 12th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIRF.2012.6160132","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
This paper presents a T/R (transmit/receive) module for X-Band phased arrays using a 0.25 μm SiGe BiCMOS process technology. The T/R module consists of a T/R switch, a SPDT switch, a power amplifier (PA), and a low noise amplifier (LNA). The T/R switch and SPDT switch are implemented using CMOS transistors whereas the PA and LNA are based on SiGe HBTs. The designed T/R switch achieves minimum 3.2 dB insertion loss, maximum 34.8 dB isolation and has a P1dB of 28.2 dBm at 10 GHz. The SPDT switch has less than 2.2 dB loss at X-Band and occupies 0.17 mm2 chip area. The PA achieves a small-signal gain of 25 dB and a saturated output power of 23.2 dBm with 25% PAE in a 3 GHz bandwidth. Lastly, the LNA has a gain more than 19 dB and 1.65 dB (mean) noise figure at X-Band. More detailed analysis with extended results and utilized techniques will be presented at the conference.