Mechanical stress caused frequency drift in cryogenic sapphire resonators

Proceedings of the 2001 IEEE International Frequncy Control Symposium and PDA Exhibition (Cat. No.01CH37218) Pub Date : 2001-06-06 DOI:10.1109/FREQ.2001.956368

S. Chang, A. Mann

引用次数: 10

Abstract

By comparing the drift rate between two nominally identical resonators, each with a choice of two closely spaced modes having a different electromagnetic configuration (E mode and H mode), it was found that variation of mechanical stress in the sapphire element induced by its mounting structure was the origin of the frequency drift of UWA 6 K sapphire oscillator reported previously. Discussions on the previously proposed mechanisms accounting for the oscillator residual frequency drift and measurement results on the relative frequency drift rate between a pair of resonators with different mechanical mounting structures are presented.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

低温蓝宝石谐振器中机械应力引起的频率漂移

通过比较两个名义上相同的谐振器之间的漂移率，每个谐振器选择两种紧密间隔的模式，具有不同的电磁配置(E模式和H模式)，发现蓝宝石元件由其安装结构引起的机械应力变化是UWA 6k蓝宝石振荡器频率漂移的根源。讨论了先前提出的振荡器剩余频率漂移的机理，并对一对不同机械安装结构的谐振器之间的相对频率漂移率进行了测量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Proceedings of the 2001 IEEE International Frequncy Control Symposium and PDA Exhibition (Cat. No.01CH37218)

自引率

0.00%

发文量

期刊最新文献

Study of flicker phase modulation and amplitude modulation noise in field effect transistor amplifiers Direct bonded quartz resonators High-temperature acoustic loss in. AT-cut, BT-cut and SC-cut quartz resonators A 2.5 ppm fully integrated CMOS analog TCXO Engineering time: inventing the quartz wristwatch