Theoretical and experimental comparison of optimized doping profiles for high-performance InP Gunn devices at 220-500 GHz

R. Kamoua, H. Eisele
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引用次数: 2

Abstract

Different types of doping profiles are investigated theoretically and experimentally for their potential of improving the performance of InP Gunn devices at J-band (220-325 GHz) frequencies and above. As initial experimental results, devices with an optimized graded doping profile generated output power levels approximately twice the previous state-of-the-art values at 280-300 GHz. Simulations identified a fiat doping profile with a notch at the cathode as even more promising. For example, an RF output power of 50 mW at 240 GHz is predicted for this profile compared to 42 mW at 240 GHz from an optimized graded doping profile.
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220-500 GHz高性能InP Gunn器件优化掺杂谱的理论与实验比较
在j波段(220-325 GHz)及以上频率下,研究了不同类型的掺杂谱在提高InP - Gunn器件性能方面的潜力。作为最初的实验结果,具有优化的梯度掺杂结构的器件在280-300 GHz产生的输出功率水平大约是先前最先进的输出功率水平的两倍。模拟结果表明,阴极上有一个缺口的固定掺杂结构更有前途。例如,与优化的梯度掺杂谱线在240 GHz时的42 mW输出功率相比,该谱线在240 GHz时的RF输出功率预计为50 mW。
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