{"title":"Reaction Kinetics of Al Films with Phosphosilicate Glass (PSG) in Semiconductors","authors":"G. Digiacomo","doi":"10.1109/IRPS.1981.363000","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":376954,"journal":{"name":"19th International Reliability Physics Symposium","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1981-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"19th International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1981.363000","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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