{"title":"New algorithm for overlapping cell treatment in hierarchical CAD data/electron beam exposure data conversion","authors":"T. Okubo, Takashi Watanabe, K. Wada","doi":"10.1109/DAC.1990.114874","DOIUrl":null,"url":null,"abstract":"An electron beam exposure system used for LSI mask making or direct writing for ASICs is considered. In CAD data/electron beam exposure-data conversion, a new algorithm for treating overlapping cells hierarchically is proposed. Geometric transformations, such as resizing, for overlapping cells are performed without referring to other cells by introducing a data marking structure. The conversion time of a 16M DRAM and 70 K-gate LSI circuits becomes as short as 23 and 62 CPU minutes, respectively, using a 12-MIPS computer.<<ETX>>","PeriodicalId":118552,"journal":{"name":"27th ACM/IEEE Design Automation Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th ACM/IEEE Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DAC.1990.114874","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
An electron beam exposure system used for LSI mask making or direct writing for ASICs is considered. In CAD data/electron beam exposure-data conversion, a new algorithm for treating overlapping cells hierarchically is proposed. Geometric transformations, such as resizing, for overlapping cells are performed without referring to other cells by introducing a data marking structure. The conversion time of a 16M DRAM and 70 K-gate LSI circuits becomes as short as 23 and 62 CPU minutes, respectively, using a 12-MIPS computer.<>
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