Three-dimensional atomic-scale investigation of defects in semiconductors by atom probe tomography

L. Rigutti, D. Blavette
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引用次数: 2

Abstract

In this chapter, the role of APT in the investigation of extended defects and solute segregation in semiconductors is discussed on the basis of several salient studies mainly carried out in our laboratory (Groupe de Physique des Materiaux) and dealing with one-dimensional (1D) (dislocations), two-dimensional (2D) (interfaces, SFs, GBs) and 3D defects (clusters, QDs). The principles of APT are first presented including a discussion of limitations in terms of spatial resolution and quantitativity. Results and performances are also compared to those of SIMS.
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用原子探针层析成像技术研究半导体缺陷的三维原子尺度
在本章中,APT在半导体扩展缺陷和溶质偏析研究中的作用是在我们实验室(Groupe de体质des Materiaux)主要进行的几个突出研究的基础上讨论的,并处理一维(1D)(位错),二维(2D)(界面,sf, gb)和三维缺陷(团簇,量子点)。首先介绍了APT的原理,包括对空间分辨率和定量方面的限制的讨论。结果和性能也与SIMS进行了比较。
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