Improved analysis of NBTI relaxation behavior based on fast I–V measurement

D. Nouguier, C. Ndiaye, G. Ghibaudo, X. Federspiel, M. Rafik, D. Roy
{"title":"Improved analysis of NBTI relaxation behavior based on fast I–V measurement","authors":"D. Nouguier, C. Ndiaye, G. Ghibaudo, X. Federspiel, M. Rafik, D. Roy","doi":"10.1109/IIRW.2016.7904908","DOIUrl":null,"url":null,"abstract":"In this paper, we propose a qualitative analysis of NBTI recoverable components measured on pFET devices issued from various ST Microelectronics (28nm FDSOI technology and 40nm SION or Bulk) technologies. NBTI degradation and recovery resulting from DC stress are measured at µs time scale. We observed similarities between temperature and Vgrecovery dependencies on NBTI relaxation of SiON and FDSOI technologies. Then, we discuss the nature of one defect type responsible for the NBTI at early stage of relaxation.","PeriodicalId":436183,"journal":{"name":"2016 IEEE International Integrated Reliability Workshop (IIRW)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Integrated Reliability Workshop (IIRW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIRW.2016.7904908","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

In this paper, we propose a qualitative analysis of NBTI recoverable components measured on pFET devices issued from various ST Microelectronics (28nm FDSOI technology and 40nm SION or Bulk) technologies. NBTI degradation and recovery resulting from DC stress are measured at µs time scale. We observed similarities between temperature and Vgrecovery dependencies on NBTI relaxation of SiON and FDSOI technologies. Then, we discuss the nature of one defect type responsible for the NBTI at early stage of relaxation.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
基于快速I-V测量的NBTI弛豫行为改进分析
在本文中,我们对不同意法半导体(28nm FDSOI技术和40nm SION或Bulk)技术生产的pet器件上测量的NBTI可恢复元件进行了定性分析。在µs时间尺度下测量直流应力引起的NBTI降解和恢复。我们观察到温度和vgrerecovery依赖于SiON和FDSOI技术的NBTI弛豫的相似性。然后,我们讨论了在松弛早期引起NBTI的一种缺陷类型的性质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Humidity and polarity influence on MIM PZT capacitor degradation and breakdown Improved analysis of NBTI relaxation behavior based on fast I–V measurement BTI variability of SRAM cells under periodically changing stress profiles Time dependent junction degradation in FinFET Reliability of power devices: Bias-induced threshold voltage instability and dielectric breakdown in GaN MIS-HEMTs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1