An extended model for carbon nanotube field-effect transistors

J. Knoch, S. Mantl, Y. Lin, Z. Chen, P. Avouris, J. Appenzeller
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引用次数: 10

Abstract

In this paper, we present an extended Schottky barrier model that includes two new crucial aspects: i) current injection from the metal contacts into the channel does not occur directly but is mediated by the segment of the nanotube underneath the metal contacts whose density of states (DOS) is altered through the proximity of the metal (referred to in the following as "metal-modified" nanotube segment); and ii) the energy gap of carbon nanotubes with an average diameter of /spl sim/1.4 nm seems to be rather /spl sim/1.2 eV than /spl sim/0.7 eV as typically assumed for these type of tubes. Our simulation allows us for the first time to quantitatively describe subthreshold characteristics of CNFETs over the entire gate voltage range.
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碳纳米管场效应晶体管的扩展模型
在本文中,我们提出了一个扩展的肖特基势垒模型,其中包括两个新的关键方面:1)从金属触点注入通道的电流不是直接发生的,而是由金属触点下方的纳米管段介导的,金属触点的态密度(DOS)通过金属的接近而改变(以下称为“金属修饰”纳米管段);ii)平均直径为/spl sim/1.4 nm的碳纳米管的能隙似乎是/spl sim/1.2 eV,而不是这些类型的碳纳米管通常假设的/spl sim/0.7 eV。我们的模拟使我们第一次定量地描述了整个栅极电压范围内cnfet的亚阈值特性。
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Complex band structure-based non-equilibrium Green's function (NEGF) transport studies for ultra-scaled carbon nanotube (CNT) transistors [CNTFETs] Nano-scale MOSFETs with programmable virtual source/drain High power AlGaN/GaN heterojunction FETs for base station applications Physical limits on binary logic switch scaling Directly lithographic top contacts for pentacene organic thin-film transistors
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