Ultrasonic Applied in Super Precision polishing of Magnetic Recording Heads

Rulin Shen, J. Zhong
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引用次数: 5

Abstract

In the traditionary nanogrinding way, a sub-nanometer smooth surface can be achieved, but the PTR can be only controlled under ten nanometers. To find a new way to reduce the PTR. ultrasonic was applied in the polishing experiment. At first, the experiment with two kinds of samples. AlTiC bulk and NiFe bulk were carried out in free abrasive lapping way with the float-piece polisher. It was discovered that the material removal rate and the roughness of surface is improved in different extent of different material, the material removal rate (MRR) of the AlTiC bulk was increased from 10 nm/m to 16 nm/m. while the MRR of the NiFe bulk was increased from 23 nm/m to 30 nm/m. Encouraged by the result of the experiment, the specimen of 70 mm*1.25 mm rowbar with 60 GMR magnetic head was polished in the same condition, as a result, the PTR was reduced from 65 nm to 45 nm. Furthermore, the ultrasonic was introduced into nanogrinding of recording head. In this way. the PTR was controlled at lnm or so and smoother surface was achieved. Two kinds of mechanism about the role of the ultrasonic were prompt to explain in what way that the material removal rate is improved and why the improved ratio is different in different materials in the polishing.
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超声波在磁头超精密抛光中的应用
传统的纳米磨削方法可以获得亚纳米级的光滑表面,但PTR只能控制在10纳米以下。寻找降低PTR的新方法。采用超声波进行抛光实验。首先,实验采用两种样品。用浮片抛光机对AlTiC体和NiFe体进行自由研磨。研究发现,不同材料对材料去除率和表面粗糙度有不同程度的提高,AlTiC体的材料去除率(MRR)由10 nm/m提高到16 nm/m。NiFe体的MRR由23 nm/m提高到30 nm/m。受实验结果的鼓舞,在同样的条件下,对70 mm*1.25 mm、60 GMR磁头的rowbar试样进行抛光,使PTR从65 nm降低到45 nm。并将超声技术引入到记录头的纳米磨削中。就这样。PTR控制在lnm左右,获得了更光滑的表面。提示两种作用机理,解释了在不同材料的抛光过程中,超声波是如何提高材料去除率的,以及为什么不同材料的去除率不同。
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