S. Bar, C.S. Wu, Ming Hu, H. Kanber, C. Pao, W. Yau
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引用次数: 2
Abstract
The authors present an approach to establishing PHEMT manufacturing technology. They discuss the impact of development work in four key process areas. They also demonstrate good wafer uniformity and wafer to wafer reproducibility for PHEMT X-band multifunction LNAs.<>
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