High voltage normally-off GaN MOSC-HEMTs on silicon substrates for power switching applications

Zhongda Li, J. Waldron, R. Dayal, L. Parsa, M. Hella, T. Chow
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引用次数: 13

Abstract

We report our experimental results on high voltage normally-off GaN MOS channel HEMTs (MOSC-HEMT) on silicon substrates with best specific on-resistance (Ron,sp) of 4 mΩ-cm2 and breakdown voltage (BV) of 840V. The switching performance of the device was evaluated by SPICE simulations of a buck-boost converter and showed a system efficiency of 10% higher than that using a commercial GaN HEMT. A bidirectional switch consisted two GaN MOSC-HEMTs were also demonstrated.
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用于功率开关应用的硅衬底上的高压正常关断GaN mosc - hemt
我们报告了在硅衬底上的高压正常关断GaN MOS沟道hemt (MOSC-HEMT)的实验结果,其最佳比导通电阻(Ron,sp)为4 mΩ-cm2,击穿电压(BV)为840V。该器件的开关性能通过buck-boost转换器的SPICE模拟进行了评估,显示系统效率比使用商用GaN HEMT高出10%。还演示了由两个GaN mosc - hemt组成的双向开关。
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