Fabrication and Characterization of GaN/Diamond bonding interface

A. Kobayashi, Y. Shimizu, Y. Ohno, S. W. Kim, K. Koyama, M. Kasu, Y. Nagai, N. Shigekawa, J. Liang
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Abstract

Direct bonding of diamond and GaN is successfully fabricated by surface activated bonding method. An 80% contact area of diamond and GaN is obtained. The effect of annealing temperature on the structure properties of the bonding interface is investigated under in-situ annealing in a transmission electron microscope (TEM).
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GaN/金刚石键合界面的制备与表征
采用表面活化键合方法成功地制备了金刚石与氮化镓的直接键合。金刚石与氮化镓的接触面积达到80%。在原位退火条件下,利用透射电镜研究了退火温度对键合界面结构性能的影响。
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