CHEMICAL VAPOR DEPOSITION OF PYROCARBON COATINGS ON POWDERS IN A FLUIDIZED BED. I. APPARATUS, FLUIDIZATION

Andrey M. Abyzov
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Abstract

A laboratory setup for chemical vapor deposition (CVD) at reduced pressure on powder of medium particle size in a fluidized bed (reactor load of 50 g of substrate) was described. Calculations of critical points for the onset of fluidization and entrainment of particles for various gases (Ar, C3H8, C4H10) at a temperature of 20–1000 °C under low vacuum (pressure of 5 kPa) were performed. Model experiments were carried out on the fluidization of corundum powder (granularity of ~300 μm) in an argon flow, as well as in the propane-butane mixture in the absence of CVD. The dependences of the hydrodynamic mode of fluidization on the nature of fluidizing gas, temperature and pressure were analyzed, which make it possible to plan the process of coating deposition itself.
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在流化床中化学气相沉积在粉末上的焦碳涂层。1 .装置,流化
描述了在流化床(反应器负荷为50g衬底)中,在减压条件下对中等粒径粉末进行化学气相沉积(CVD)的实验室装置。计算了不同气体(Ar、C3H8、C4H10)在温度为20 ~ 1000℃、低真空(压力为5 kPa)条件下开始流态化和颗粒夹带的临界点。对刚玉粉(粒度~300 μm)在氩气和丙烷-丁烷混合物中无气相沉积的流态化进行了模型实验。分析了流化流体动力模式对流化气体性质、温度和压力的依赖关系,从而为涂层沉积过程本身的规划提供了可能。
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