Highly Reproducible Synthesis of Hollow Zirconia Particles via Atmospheric-Pressure Plasma Processing with Inkjet Droplets

IF 2.5 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2023-10-20 DOI:10.1007/s11090-023-10412-0

Kaishu Nitta, Tomoki Sakai, Hitoshi Muneoka, Yoshiki Shimizu, Hiromichi Kobayashi, Kazuo Terashima, Tsuyohito Ito

{"title":"Highly Reproducible Synthesis of Hollow Zirconia Particles via Atmospheric-Pressure Plasma Processing with Inkjet Droplets","authors":"Kaishu Nitta, Tomoki Sakai, Hitoshi Muneoka, Yoshiki Shimizu, Hiromichi Kobayashi, Kazuo Terashima, Tsuyohito Ito","doi":"10.1007/s11090-023-10412-0","DOIUrl":null,"url":null,"abstract":"<div><p>Hollow particles have attracted considerable attention owing to their unique properties. In this study, hollow monoclinic zirconia particles were directly synthesized from inkjet droplets of a zirconyl hydroxychloride aqueous solution via atmospheric-pressure plasma processing. Hollow structures with craggy surfaces were obtained in the plasma at gas temperatures above 1000 K. The steep solvent evaporation rate induced by the localized high-energy reaction field of the atmospheric-pressure plasma may have induced solute condensation near the droplet surface and contributed to the formation of hollow particles. The average diameter of the synthesized particles was ~ 3 μm, while their size distribution was narrow (coefficient of variation: 0.06–0.10). The high reproducibility of the synthesized particles was attributed to the small variations in inkjet droplet size. The proposed method enables the rapid synthesis of hollow particles of various inorganic materials, while controlling their number and composition.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 1","pages":"289 - 303"},"PeriodicalIF":2.5000,"publicationDate":"2023-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-023-10412-0.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Chemistry and Plasma Processing","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11090-023-10412-0","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}

引用次数: 0

Abstract

Hollow particles have attracted considerable attention owing to their unique properties. In this study, hollow monoclinic zirconia particles were directly synthesized from inkjet droplets of a zirconyl hydroxychloride aqueous solution via atmospheric-pressure plasma processing. Hollow structures with craggy surfaces were obtained in the plasma at gas temperatures above 1000 K. The steep solvent evaporation rate induced by the localized high-energy reaction field of the atmospheric-pressure plasma may have induced solute condensation near the droplet surface and contributed to the formation of hollow particles. The average diameter of the synthesized particles was ~ 3 μm, while their size distribution was narrow (coefficient of variation: 0.06–0.10). The high reproducibility of the synthesized particles was attributed to the small variations in inkjet droplet size. The proposed method enables the rapid synthesis of hollow particles of various inorganic materials, while controlling their number and composition.

Abstract Image

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

利用喷墨液滴进行常压等离子处理，实现中空氧化锆颗粒的高重复性合成

空心颗粒因其独特的性能而备受关注。在这项研究中，通过常压等离子体处理，从喷墨液滴的羟基氯化锆水溶液中直接合成了空心单斜氧化锆颗粒。常压等离子体的局部高能反应场导致溶剂蒸发速度加快，这可能诱发了液滴表面附近的溶质凝结，并促成了空心颗粒的形成。合成颗粒的平均直径约为 3 μm，粒度分布较窄（变异系数：0.06-0.10）。合成颗粒的高重现性归因于喷墨液滴尺寸的微小变化。所提出的方法可以快速合成各种无机材料的空心颗粒，同时控制其数量和组成。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.