Design and large-scale nanofabrication of plasmonic solar light absorbers

M. Serra González, M. Keil, R. Deshpande, S. Kadkhodazadeh, N. Okulova, R. J. Taboryski
{"title":"Design and large-scale nanofabrication of plasmonic solar light absorbers","authors":"M. Serra González, M. Keil, R. Deshpande, S. Kadkhodazadeh, N. Okulova, R. J. Taboryski","doi":"10.1116/6.0002998","DOIUrl":null,"url":null,"abstract":"Surface plasmon resonances have been exploited for many applications due to their tunability, which is directly related to the geometry of nanostructures. Based on their dimension and material stack, the resonances can be tailored to achieve high absorbing or reflecting nanopatterned surfaces designed for specific wavelengths. While the preferred lithographic printing techniques in the field allow high precision and control of the structures, they are limited in throughput, thus restricting possible large-scale applications. In this work, we present a full process flow, which can produce hundreds of square meters of nanopillar arrays by combining resolution enhancement techniques (RETs) on a deep-UV stepper for fabricating a silicon master and roll-to-roll extrusion coating (R2R-EC) for its replication. We demonstrate optimized exposures with the combination of dipole off-axis illumination, triple cross-exposure, and the addition of assisted features on the mask design. By simulating the RETs compared to a conventional setup, we show how lithographic parameters such as the normalized image log-slope (NILS) improve from 0.90 to 2.05 or the resist image contrast (RIC) increases from 0.429 to 0.813. We confirm these results by printing wafer-size hexagonal and rectangular arrays of nanopillars with 340, 350, and 360 nm pitches and diameters ranging from 100 to 200 nm. We show the successful replication of both designs by R2R-EC, an industrial process, which produces hundred-meter rolls of patterned polymer. We demonstrate that after metallization, the samples are suitable for solar absorption by measuring their absorptance (absorbed to incident intensity) and comparing it with the solar irradiance peak. We achieve a 70% efficiency for both hexagonal and rectangular arrays at resonant peaks of 550 and 600 nm, respectively, where the hexagonal array better matches the solar irradiance peak. Additionally, the plasmonic samples block 78% of the heat radiation when compared to a plain black polymer foil for reference, making them more efficient for solar harvesting applications.","PeriodicalId":17571,"journal":{"name":"Journal of Vacuum Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0002998","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Surface plasmon resonances have been exploited for many applications due to their tunability, which is directly related to the geometry of nanostructures. Based on their dimension and material stack, the resonances can be tailored to achieve high absorbing or reflecting nanopatterned surfaces designed for specific wavelengths. While the preferred lithographic printing techniques in the field allow high precision and control of the structures, they are limited in throughput, thus restricting possible large-scale applications. In this work, we present a full process flow, which can produce hundreds of square meters of nanopillar arrays by combining resolution enhancement techniques (RETs) on a deep-UV stepper for fabricating a silicon master and roll-to-roll extrusion coating (R2R-EC) for its replication. We demonstrate optimized exposures with the combination of dipole off-axis illumination, triple cross-exposure, and the addition of assisted features on the mask design. By simulating the RETs compared to a conventional setup, we show how lithographic parameters such as the normalized image log-slope (NILS) improve from 0.90 to 2.05 or the resist image contrast (RIC) increases from 0.429 to 0.813. We confirm these results by printing wafer-size hexagonal and rectangular arrays of nanopillars with 340, 350, and 360 nm pitches and diameters ranging from 100 to 200 nm. We show the successful replication of both designs by R2R-EC, an industrial process, which produces hundred-meter rolls of patterned polymer. We demonstrate that after metallization, the samples are suitable for solar absorption by measuring their absorptance (absorbed to incident intensity) and comparing it with the solar irradiance peak. We achieve a 70% efficiency for both hexagonal and rectangular arrays at resonant peaks of 550 and 600 nm, respectively, where the hexagonal array better matches the solar irradiance peak. Additionally, the plasmonic samples block 78% of the heat radiation when compared to a plain black polymer foil for reference, making them more efficient for solar harvesting applications.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
等离子体太阳能光吸收器的设计与大规模纳米制造
表面等离子体共振由于其可调性而被应用于许多领域,这与纳米结构的几何形状直接相关。基于它们的尺寸和材料堆叠,可以定制共振以实现针对特定波长设计的高吸收或反射纳米图案表面。虽然该领域的首选平版印刷技术允许高精度和结构控制,但它们的吞吐量有限,因此限制了可能的大规模应用。在这项工作中,我们提出了一个完整的工艺流程,通过将分辨率增强技术(RETs)结合在深紫外步进器上,用于制造硅母材和用于复制的卷对卷挤出涂层(R2R-EC),可以生产数百平方米的纳米柱阵列。我们通过偶极子离轴照明、三重交叉曝光和在掩模设计上添加辅助特征来优化曝光。通过模拟RETs与传统设置的比较,我们展示了光刻参数(如归一化图像对数斜率(NILS))如何从0.90提高到2.05,或者抗蚀图像对比度(RIC)如何从0.429提高到0.813。我们通过打印具有340,350和360纳米间距,直径从100到200纳米的晶圆尺寸的六边形和矩形纳米柱阵列来证实这些结果。我们展示了R2R-EC对这两种设计的成功复制,这是一种工业过程,可以生产百米长的图案聚合物卷。我们通过测量金属化后样品的吸收率(吸收与入射强度之比)并将其与太阳辐照峰进行比较,证明了金属化后样品适合太阳吸收。在550 nm和600 nm的共振峰处,六角形阵列和矩形阵列的效率分别达到70%,其中六角形阵列更好地匹配太阳辐照峰。此外,与普通的黑色聚合物箔相比,等离子体样品阻挡了78%的热辐射,使其更有效地用于太阳能收集应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy Modification of discharge sequences to control the random dispersion of flake particles during wafer etching Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation E-mode AlGaN/GaN HEMTs using p-NiO gates Review on remote phonon scattering in transistors with metal-oxide-semiconductor structures adopting high-k gate dielectrics
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1