Investigation of polymer template removal techniques in three-dimensional thin-shell nanolattices

Vijay Anirudh Premnath, Chih-Hao Chang
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Abstract

Recent advanced in nanofabrication has enabled various opportunities for research and development in photonic crystals, integrated circuits, and nanostructured materials. One interesting class of emerging materials is nanolattices, which consist of hollow-core, thin-shell elements fabricated using thin-film deposition on three-dimensional polymer templates. While many applications of nanolattices have been demonstrated, the residual polymer in the nanolattice can be problematic and is not well understood. This research investigates the effectiveness of different template removal techniques, including oxygen plasma etching, solvent dissolution, and thermal desorption. The rates and effectiveness of resist removal for the different techniques are quantified using spectroscopic ellipsometry, which enables precise measurement of the effective refractive index and calculation of the residual polymer. A three-phase Maxwell–Garnett effective medium model is used to calculate the residual polymer in the nanolattices. This work demonstrates that the temperature treatment is most effective at template removal, which can be used to improve the fabrication of nanolattices for mechanical, optical, and thermal applications.
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三维薄壳纳米晶格中聚合物模板去除技术的研究
纳米制造的最新进展为光子晶体、集成电路和纳米结构材料的研究和开发提供了各种机会。一类有趣的新兴材料是纳米晶格,它由空心核、薄壳元素组成,使用薄膜沉积在三维聚合物模板上。虽然纳米晶格的许多应用已经被证明,但纳米晶格中残留的聚合物可能是有问题的,而且还没有得到很好的理解。本研究考察了不同模板去除技术的有效性,包括氧等离子蚀刻、溶剂溶解和热脱附。不同技术的抗蚀剂去除速率和有效性使用光谱椭偏法进行量化,这可以精确测量有效折射率和计算残余聚合物。采用三相麦克斯韦-加内特有效介质模型计算了纳米晶格中的残余聚合物。这项工作表明,温度处理在模板去除方面是最有效的,这可以用于改进机械、光学和热应用的纳米晶格的制造。
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