{"title":"The Effect of Grain Size on the Structure and Phase Composition of VТ1-0 Alloy Implanted with Aluminum Ions","authors":"","doi":"10.1134/s1063785023700098","DOIUrl":null,"url":null,"abstract":"<span> <h3>Abstract</h3> <p>The structural and phase state of the surface layers of technically pure titanium (VT1-0 alloy) implanted with aluminum ions in three states (submicrocrystalline, ultrafine-grained, and fine-grained) obtained by multiple uniaxial pressing (abc pressing) followed by multipass rolling in groove rolls at room temperature and subsequent annealing at 573, 673, and 773 K for 1 h, respectively, has been studied by transmission electron microscopy and energy dispersive X-ray spectroscopy on foils cut perpendicular to the machined sample surface. Ion implantation has been performed for 8 h and 20 min at an irradiation dose of 10 × 10<sup>17</sup> ions/cm<sup>2</sup> and a temperature of 623 K. It has been found that the implantation led to the formation of a gradient structure consisting of five layers. For each layer, the thickness, phase composition, and shape and arrangement of second-phase particles have been determined and the α-Ti grain size and the size, distribution density, and volume fractions of separated particles have been measured. It has been established that the implantation causes the formation of Ti<sub>3</sub>Al and TiAl<sub>3</sub> intermetallic phases. Ti<sub>3</sub>Al particles have a lamellar shape and are located inside parts of α-Ti grains, while TiAl<sub>3</sub> particles have a rounded shape and are arranged randomly.</p> </span>","PeriodicalId":784,"journal":{"name":"Technical Physics Letters","volume":null,"pages":null},"PeriodicalIF":0.8000,"publicationDate":"2023-12-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s1063785023700098","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
The structural and phase state of the surface layers of technically pure titanium (VT1-0 alloy) implanted with aluminum ions in three states (submicrocrystalline, ultrafine-grained, and fine-grained) obtained by multiple uniaxial pressing (abc pressing) followed by multipass rolling in groove rolls at room temperature and subsequent annealing at 573, 673, and 773 K for 1 h, respectively, has been studied by transmission electron microscopy and energy dispersive X-ray spectroscopy on foils cut perpendicular to the machined sample surface. Ion implantation has been performed for 8 h and 20 min at an irradiation dose of 10 × 1017 ions/cm2 and a temperature of 623 K. It has been found that the implantation led to the formation of a gradient structure consisting of five layers. For each layer, the thickness, phase composition, and shape and arrangement of second-phase particles have been determined and the α-Ti grain size and the size, distribution density, and volume fractions of separated particles have been measured. It has been established that the implantation causes the formation of Ti3Al and TiAl3 intermetallic phases. Ti3Al particles have a lamellar shape and are located inside parts of α-Ti grains, while TiAl3 particles have a rounded shape and are arranged randomly.
期刊介绍：
Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.
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