{"title":"An ultralow concentration of Cr2O3 dopants driven lower temperature sintering ZnO-based varistor ceramics","authors":"Yadong Cheng, Liaoying Zheng, Huarong Zeng, Tian Tian, Xue Shi, Zhenyong Man, Xuezheng Ruan, Guorong Li, Min Zhu","doi":"10.1002/pssr.202400030","DOIUrl":null,"url":null,"abstract":"Low working voltage driven ZnO-based varistor ceramics play an important role in the multilayer chip varistors, which require a low sintering temperature of ZnO varistor for its low energy consumption. Herein a remarkable reduction of the sintering temperature from the usual 1100°C-1300°C to 950°C was successfully achieved in the ZnO ceramics via a certain 0.05 mole percent of Cr<sub>2</sub>O<sub>3</sub> dopants. The underlying mechanism was found to be involved with the formation of basal-plane inversion boundaries between the ZnO grains, which can promote the rapid grain growth within the ceramics. Furthermore, the ZnO varistors with 0.05 mol% Cr<sub>2</sub>O<sub>3</sub> dopant exhibited excellent performance. A low breakdown voltage of 416 V/mm, a high nonlinear coefficient of 39, and a low leakage current of 3.4 μA were obtained simultaneously. This work presents an effective and promising approach for the cost-efficient preparation of high-performance ZnO-based varistors, which has particular significance for the application of multilayer chip varistors with low working voltage.","PeriodicalId":54619,"journal":{"name":"Physica Status Solidi-Rapid Research Letters","volume":"83 1","pages":""},"PeriodicalIF":2.5000,"publicationDate":"2024-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica Status Solidi-Rapid Research Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/pssr.202400030","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Low working voltage driven ZnO-based varistor ceramics play an important role in the multilayer chip varistors, which require a low sintering temperature of ZnO varistor for its low energy consumption. Herein a remarkable reduction of the sintering temperature from the usual 1100°C-1300°C to 950°C was successfully achieved in the ZnO ceramics via a certain 0.05 mole percent of Cr2O3 dopants. The underlying mechanism was found to be involved with the formation of basal-plane inversion boundaries between the ZnO grains, which can promote the rapid grain growth within the ceramics. Furthermore, the ZnO varistors with 0.05 mol% Cr2O3 dopant exhibited excellent performance. A low breakdown voltage of 416 V/mm, a high nonlinear coefficient of 39, and a low leakage current of 3.4 μA were obtained simultaneously. This work presents an effective and promising approach for the cost-efficient preparation of high-performance ZnO-based varistors, which has particular significance for the application of multilayer chip varistors with low working voltage.
期刊介绍:
Physica status solidi (RRL) - Rapid Research Letters was designed to offer extremely fast publication times and is currently one of the fastest double peer-reviewed publication media in solid state and materials physics. Average times are 11 days from submission to first editorial decision, and 12 days from acceptance to online publication. It communicates important findings with a high degree of novelty and need for express publication, as well as other results of immediate interest to the solid-state physics and materials science community. Published Letters require approval by at least two independent reviewers.
The journal covers topics such as preparation, structure and simulation of advanced materials, theoretical and experimental investigations of the atomistic and electronic structure, optical, magnetic, superconducting, ferroelectric and other properties of solids, nanostructures and low-dimensional systems as well as device applications. Rapid Research Letters particularly invites papers from interdisciplinary and emerging new areas of research.