Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations.

IF 2.4 3区物理与天体物理 Q2 INSTRUMENTS & INSTRUMENTATION Journal of Synchrotron Radiation Pub Date : 2024-04-17 DOI:10.1107/S1600577524002534

J. B. Knappett, Blair Haydon, Bruce C. C. Cowie, C. Kewish, Grant A van Riessen

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Abstract

Synchrotron light sources can provide the required spatial coherence, stability and control to support the development of advanced lithography at the extreme ultraviolet and soft X-ray wavelengths that are relevant to current and future fabricating technologies. Here an evaluation of the optical performance of the soft X-ray (SXR) beamline of the Australian Synchrotron (AS) and its suitability for developing interference lithography using radiation in the 91.8 eV (13.5 nm) to 300 eV (4.13 nm) range are presented. A comprehensive physical optics model of the APPLE-II undulator source and SXR beamline was constructed to simulate the properties of the illumination at the proposed location of a photomask, as a function of photon energy, collimation and monochromator parameters. The model is validated using a combination of experimental measurements of the photon intensity distribution of the undulator harmonics. It is shown that the undulator harmonics intensity ratio can be accurately measured using an imaging detector and controlled using beamline optics. Finally, the photomask geometric constraints and achievable performance for the limiting case of fully spatially coherent illumination are evaluated.

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通过波前传播模拟评估 AS 的 X 射线/紫外线纳米光刻设备。

同步辐射光源可以提供所需的空间相干性、稳定性和控制性，以支持开发与当前和未来制造技术相关的极紫外和软 X 射线波长的先进光刻技术。本文介绍了澳大利亚同步加速器（AS）软 X 射线（SXR）光束线的光学性能评估，以及该光束线在 91.8 eV (13.5 nm) 至 300 eV (4.13 nm) 辐射范围内开发干涉光刻技术的适用性。建立了一个 APPLE-II undulator 源和 SXR 光束线的综合物理光学模型，以模拟光掩膜拟议位置的照明特性，该特性是光子能量、准直和单色器参数的函数。结合对谐波光子强度分布的实验测量结果，对模型进行了验证。结果表明，可以使用成像探测器精确测量起伏谐波强度比，并使用光束线光学技术进行控制。最后，还评估了光掩膜的几何限制以及在完全空间相干照明的极限情况下可实现的性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Synchrotron Radiation 物理-光学

CiteScore

5.10

自引率

12.00%

发文量

289

审稿时长

4-8 weeks

期刊介绍： Synchrotron radiation research is rapidly expanding with many new sources of radiation being created globally. Synchrotron radiation plays a leading role in pure science and in emerging technologies. The Journal of Synchrotron Radiation provides comprehensive coverage of the entire field of synchrotron radiation and free-electron laser research including instrumentation, theory, computing and scientific applications in areas such as biology, nanoscience and materials science. Rapid publication ensures an up-to-date information resource for scientists and engineers in the field.