{"title":"Short-time high-temperature oxidation behavior of nanocrystalline Ta coating at 850 °C","authors":"Yunsong Niu, Lingling Xing, Shenglong Zhu, Jinfeng Huang, Minghui Chen, Fuhui Wang, Qiang Chen","doi":"10.1038/s41529-024-00465-7","DOIUrl":null,"url":null,"abstract":"Short-time oxidation behavior of nanocrystalline Ta coating is studied at 850 °C in comparison with that of the Ta sheet. Owing to the large PBR value and insufficient expansion space, the oxide scale on Ta sheet is dramatically cracked, delaminated and pulverized, resulting in rapid deterioration. For nanocrystalline Ta coatings with columnar structures and quantitative grain boundaries, a rapid oxygen diffusion rate causes no initial Ta2O5 to form. The gap between columns provides spaces for bulk expansion, resulting in few opening cracks and delamination. Ta oxidation experiences a crystallization course from amorphous Ta oxide, leading to in situ temperature surging and thus pulverization.","PeriodicalId":19270,"journal":{"name":"npj Materials Degradation","volume":null,"pages":null},"PeriodicalIF":6.6000,"publicationDate":"2024-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.nature.com/articles/s41529-024-00465-7.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"npj Materials Degradation","FirstCategoryId":"88","ListUrlMain":"https://www.nature.com/articles/s41529-024-00465-7","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Short-time oxidation behavior of nanocrystalline Ta coating is studied at 850 °C in comparison with that of the Ta sheet. Owing to the large PBR value and insufficient expansion space, the oxide scale on Ta sheet is dramatically cracked, delaminated and pulverized, resulting in rapid deterioration. For nanocrystalline Ta coatings with columnar structures and quantitative grain boundaries, a rapid oxygen diffusion rate causes no initial Ta2O5 to form. The gap between columns provides spaces for bulk expansion, resulting in few opening cracks and delamination. Ta oxidation experiences a crystallization course from amorphous Ta oxide, leading to in situ temperature surging and thus pulverization.
研究了纳米晶 Ta 涂层在 850 ℃ 下的短时氧化行为,并与 Ta 板的短时氧化行为进行了比较。由于 PBR 值较大且膨胀空间不足,Ta 片上的氧化鳞片出现了明显的裂纹、分层和粉化,从而导致快速劣化。对于具有柱状结构和定量晶界的纳米晶 Ta 涂层,快速的氧扩散速度不会形成初始的 Ta2O5。柱状结构之间的间隙为体积膨胀提供了空间,因此很少出现开口裂纹和分层。Ta 氧化经历了从无定形 Ta 氧化物结晶的过程,导致原位温度骤升,进而粉碎。
期刊介绍:
npj Materials Degradation considers basic and applied research that explores all aspects of the degradation of metallic and non-metallic materials. The journal broadly defines ‘materials degradation’ as a reduction in the ability of a material to perform its task in-service as a result of environmental exposure.
The journal covers a broad range of topics including but not limited to:
-Degradation of metals, glasses, minerals, polymers, ceramics, cements and composites in natural and engineered environments, as a result of various stimuli
-Computational and experimental studies of degradation mechanisms and kinetics
-Characterization of degradation by traditional and emerging techniques
-New approaches and technologies for enhancing resistance to degradation
-Inspection and monitoring techniques for materials in-service, such as sensing technologies