Ionizing radiation defects and reliability of Gallium Nitride-based III-V semiconductor devices: A comprehensive review

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Microelectronics Reliability Pub Date : 2024-06-25 DOI:10.1016/j.microrel.2024.115445
V. Sandeep , J. Charles Pravin , S. Ashok Kumar
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Abstract

The remote sensing and satellite community working for space organizations have expressed interest in building advanced devices with potential choices for Gallium Nitride based transistors. Radar and satellite communication applications employ nitride High Electron Mobility Transistors (HEMTs) due to their high radiation-absorbing and temperature tolerant qualities. However, they also deteriorate simultaneously upon such radiations that cause a drastic fall in their lifetimes. This article carries out reliability studies of GaN-based III-V semiconductor devices, including HEMTs, Schottky and thin film diodes by reviewing the defects induced by radiation. A review of the various kinds of defects induced in these devices upon subject to several radiation beams like proton, neutron, gamma, alpha, and other sources has been discussed here. GaN, when subject to high energy ionizing radiation particles, produce point defects in the material that are more dominated by extended disordered regions. Trap states also occur as a part of radiation damage with forbidden gaps consisting of deep thermal ionization energies, which causes the device’s mobility and electrical conductivity to decrease drastically. A short description on how these defects can be mitigated to a certain extent has been given, eying towards more withstanding capabilities for these devices in radiation-hardened environments.

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电离辐射缺陷与氮化镓基 III-V 半导体器件的可靠性:全面回顾
为太空组织工作的遥感和卫星界对制造先进设备表示出浓厚的兴趣,并有可能选择基于氮化镓的晶体管。雷达和卫星通信应用采用的氮化高电子迁移率晶体管(HEMT)具有高辐射吸收性和温度耐受性。然而,氮化物高电子迁移率晶体管在受到辐射时也会同时发生老化,从而导致其寿命急剧下降。本文通过回顾辐射诱发的缺陷,对基于氮化镓的 III-V 半导体器件(包括 HEMT、肖特基二极管和薄膜二极管)进行可靠性研究。本文讨论了这些器件在受到质子、中子、伽马射线、α射线和其他辐射源等多种辐射束时诱发的各种缺陷。氮化镓在受到高能电离辐射粒子的作用时,会在材料中产生点缺陷,这些点缺陷主要由扩展的无序区构成。作为辐射损伤的一部分,阱态也会出现,其禁隙由深层热电离能组成,从而导致器件的迁移率和导电率急剧下降。本文简要介绍了如何在一定程度上缓解这些缺陷,以期提高这些器件在辐射加固环境中的耐受能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Microelectronics Reliability
Microelectronics Reliability 工程技术-工程:电子与电气
CiteScore
3.30
自引率
12.50%
发文量
342
审稿时长
68 days
期刊介绍: Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged. Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.
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