Mechanically strong and room-temperature magnetocaloric monolayer VSi2N4 semiconductor

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2024-07-10 DOI:10.1063/5.0208546
Weiwei He, Yan Yin, Ziming Tang, Xiaofan Wang, Hang Yuan, Qihua Gong, Min Yi
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Abstract

In the realm of emerging two-dimensional MoSi2N4 family, the majority of research endeavors gravitate toward their versatile physical properties, while their magnetocaloric effect (MCE) for the potential refrigeration application remains uncharted. Here, we comprehensively explore the magnetic, electronic, mechanical, and magnetocaloric properties of monolayer VA2Z4 (A = Si, Ge; Z = N, P, As) family by multiscale simulations, revealing that monolayer VSi2N4 semiconductor is mechanically strong and exhibits room-temperature MCE. The nonlinear elastic response of VSi2N4 unveils strong mechanical properties, featuring a substantial in-plane Young's modulus (E2D∼ 350 N/m) and a high strength of 40.8 N/m, comparable to that of graphene. Monolayer VSi2N4 exhibits a room-temperature MCE with an extensive refrigeration temperature range up to 20 K. Furthermore, applying biaxial strain can significantly improve the maximum magnetic entropy change (−ΔSMmax) and maximum adiabatic temperature change (ΔTadmax) by 80.9% and 197.3%, respectively. Room-temperature MCE with wide working temperature and mechanical robustness make monolayer VSi2N4 an appealing candidate for magnetic refrigeration applications over large temperature range. These findings offer fresh insights for advancing the development of magnetic cooling in small-sized systems.
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机械强度和室温磁致性单层 VSi2N4 半导体
在新兴的二维 MoSi2N4 家族领域,大多数研究工作都集中在其多变的物理特性上,而其用于潜在制冷应用的磁致效应(MCE)仍是未知领域。在这里,我们通过多尺度模拟全面探索了单层 VA2Z4(A = Si、Ge;Z = N、P、As)家族的磁性、电子、机械和磁致性,发现单层 VSi2N4 半导体具有很强的机械强度,并表现出室温 MCE。VSi2N4 的非线性弹性响应揭示了其强大的机械特性,具有很大的面内杨氏模量(E2D∼ 350 N/m)和 40.8 N/m 的高强度,与石墨烯相当。单层 VSi2N4 具有室温 MCE 特性,制冷温度范围宽达 20 K。此外,施加双轴应变可显著改善最大磁熵变化(-ΔSMmax)和最大绝热温度变化(ΔTadmax),分别提高 80.9% 和 197.3%。室温 MCE 具有较宽的工作温度和机械坚固性,使单层 VSi2N4 成为大温度范围磁制冷应用的理想候选材料。这些发现为推动小型系统的磁制冷发展提供了新的见解。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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