Creation and Characterization of Nanoscale Ribbons on MoS2 by Atomic Force Microscope Nanolithography

IF 1.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY ECS Journal of Solid State Science and Technology Pub Date : 2024-07-18 DOI:10.1149/2162-8777/ad60ff
Yangyang Guo, Jing Sun, Cheng Wang, Yanni Yang and Junjie Wang
{"title":"Creation and Characterization of Nanoscale Ribbons on MoS2 by Atomic Force Microscope Nanolithography","authors":"Yangyang Guo, Jing Sun, Cheng Wang, Yanni Yang and Junjie Wang","doi":"10.1149/2162-8777/ad60ff","DOIUrl":null,"url":null,"abstract":"The atomic force microscope (AFM) has been widely used for fabricating the nanoscale oxide ribbons on various materials surface. Herein, we first conducted local anodic oxidation (LAO) lithography on two-dimensional nanomaterial (2D), i.e. multilayer MoS2, using AFM. The correlation of patterning behavior on the MoS2 flakes between the lithography conditions was investigated. The height and full width half maximum (FWHM) increase linearly with increasing tip voltage, even at different tip speeds, which is consistent with the results obtained from the Cabrera-Mott oxidation theory. The size of the clear relation decreases linearly with increasing tip speed, indicating that longer tip writing patterns result in more oxidation. The formation mechanism of the patterned oxide lines is presented along with LAO reaction processes.The final LAO lithography products have been demonstrated to be MoO2 and MoO3 by micro-Raman spectroscopy. These results show that LAO lithography using AFM is an effective technique for nanofabrication of nanodevices.","PeriodicalId":11496,"journal":{"name":"ECS Journal of Solid State Science and Technology","volume":null,"pages":null},"PeriodicalIF":1.8000,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ECS Journal of Solid State Science and Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1149/2162-8777/ad60ff","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The atomic force microscope (AFM) has been widely used for fabricating the nanoscale oxide ribbons on various materials surface. Herein, we first conducted local anodic oxidation (LAO) lithography on two-dimensional nanomaterial (2D), i.e. multilayer MoS2, using AFM. The correlation of patterning behavior on the MoS2 flakes between the lithography conditions was investigated. The height and full width half maximum (FWHM) increase linearly with increasing tip voltage, even at different tip speeds, which is consistent with the results obtained from the Cabrera-Mott oxidation theory. The size of the clear relation decreases linearly with increasing tip speed, indicating that longer tip writing patterns result in more oxidation. The formation mechanism of the patterned oxide lines is presented along with LAO reaction processes.The final LAO lithography products have been demonstrated to be MoO2 and MoO3 by micro-Raman spectroscopy. These results show that LAO lithography using AFM is an effective technique for nanofabrication of nanodevices.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
通过原子力显微镜纳米光刻技术在 MoS2 上创建纳米级带状材料并对其进行表征
原子力显微镜(AFM)已被广泛用于在各种材料表面制备纳米级氧化物带。在此,我们首次利用原子力显微镜在二维纳米材料(即多层 MoS2)上进行了局部阳极氧化(LAO)光刻。研究了不同光刻条件下 MoS2 薄片上图案化行为的相关性。高度和全宽半最大值(FWHM)随着针尖电压的增加而线性增加,即使在不同的针尖速度下也是如此,这与卡布雷拉-莫特氧化理论得出的结果一致。清晰关系的大小随针尖速度的增加而线性减小,这表明较长的针尖书写图案会导致更多的氧化。通过微拉曼光谱分析,最终的 LAO 光刻产物被证明是 MoO2 和 MoO3。这些结果表明,使用原子力显微镜进行 LAO 光刻是一种有效的纳米器件制造技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
ECS Journal of Solid State Science and Technology
ECS Journal of Solid State Science and Technology MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
4.50
自引率
13.60%
发文量
455
期刊介绍: The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices. JSS has five topical interest areas: carbon nanostructures and devices dielectric science and materials electronic materials and processing electronic and photonic devices and systems luminescence and display materials, devices and processing.
期刊最新文献
Au-free V/Al/Pt Contacts on n-Al0.85Ga0.15N:Si Surfaces of Far-UVC LEDs Structural Characteristics and Dielectric Properties of Deposited Silver Nanoparticles with Polypyrrole on PET Films for Dielectric Devices Modification of Structural, Optical, and Electrical Properties of PVA/PVP Blend Filled by Nanostructured Titanium Dioxide for Optoelectronic Applications Low Contact Resistance via Quantum Well Structure in Amorphous InMoO Thin Film Transistors Comparative Analysis of 50 MeV Li3+ and 100 MeV O7+ Ion Beam Induced Electrical Modifications in Silicon Photodetectors
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1