Electrically-driven IMT and volatile memristor behavior in NdNiO3 films

IF 3.1 3区 物理与天体物理 Q2 PHYSICS, APPLIED Journal of Physics D: Applied Physics Pub Date : 2024-09-04 DOI:10.1088/1361-6463/ad714e
O D Schneble, I A Leahy, J D Zimmerman, M B Tellekamp
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Abstract

Transition metal oxides with insulator-metal transitions (IMTs) are uniquely suited for volatile memristor devices that mimic the spiking of biological neurons. Unlike most non-volatile memristors, which often operate via ion migration into filaments, volatile devices utilize a reversible phase change that returns to a ground state in the absence of applied stimulus. In these devices, Joule heating triggers the IMT and changes the bulk resistivity rather than influencing conduction through defects, as in previous studies. This volatile resistive switching behavior has previous been leveraged in niobium and vanadium oxides, but not in rare-earth nickelates, despite their tunable transition temperatures. This study demonstrates an electrically driven IMT in the prototypical rare-earth nickelate, NdNiO3, in large area devices. While previous work examining the electrically-driven IMT in NdNiO3 suggests defect-dominated conduction, this study shows clear s-type negative differential resistance (NDR) consistent with temperature-dependent resistivity measurements. The NDR peak-to-valley voltage scales linearly with temperature as expected for conductivity pathways dominated by bulk IMT behavior. Unlike other transition metal oxides, which are modeled using the insulator-metal phase fraction as the internal state variable, a thermoelectric model with temperature as the internal state variable is found to more accurately describe the current–voltage characteristic of NdNiO3 volatile memristors. Overall, we report the synthesis, fabrication, and characterization of NdNiO3 volatile memristors with resistivity dominated by bulk-like IMT behavior which is scalable and not dependent upon oxygen vacancy migration or defect mediated conduction pathways.
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NdNiO3 薄膜中的电驱动 IMT 和挥发性记忆晶体行为
具有绝缘体-金属转换(IMT)的过渡金属氧化物是模仿生物神经元尖峰脉冲的挥发性忆阻器器件的独特选择。大多数非挥发性忆阻器通常通过离子迁移到丝状物中来工作,而挥发性器件则不同,它利用可逆相变,在没有外加刺激的情况下返回到基态。在这些器件中,焦耳加热会触发 IMT 并改变体电阻率,而不是像以前的研究那样通过缺陷影响传导。铌和钒氧化物以前曾利用过这种挥发性电阻开关行为,但稀土镍酸盐却没有,尽管它们的转变温度是可调的。本研究在大面积器件中演示了原型稀土镍酸盐 NdNiO3 的电驱动 IMT。以往研究 NdNiO3 中电驱动 IMT 的工作表明,缺陷主导传导,而本研究则显示出明显的 s 型负微分电阻 (NDR),与随温度变化的电阻率测量结果一致。NDR 的峰谷电压与温度成线性关系,这是由块体 IMT 行为主导的传导路径所预期的。与使用绝缘体-金属相分数作为内部状态变量建模的其他过渡金属氧化物不同,以温度作为内部状态变量的热电模型能更准确地描述 NdNiO3 挥发性忆阻器的电流-电压特性。总之,我们报告了 NdNiO3 挥发性忆阻器的合成、制造和特性分析,这种忆阻器的电阻率以块状 IMT 行为为主,具有可扩展性,并且不依赖于氧空位迁移或缺陷介导的传导途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics 物理-物理:应用
CiteScore
6.80
自引率
8.80%
发文量
835
审稿时长
2.1 months
期刊介绍: This journal is concerned with all aspects of applied physics research, from biophysics, magnetism, plasmas and semiconductors to the structure and properties of matter.
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