Reductive Degradation of Florfenicol by Electrogenerated Hydrated Electrons via the Electron Tunneling Effect

IF 7.4 Q1 ENGINEERING, ENVIRONMENTAL ACS ES&T engineering Pub Date : 2024-09-19 DOI:10.1021/acsestengg.4c00326
Lu Wang, Guoshuai Liu, Qifang Lu, Hua Zou, Shijie You
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Abstract

Degradation of fluorinated organic pollutants remains a challenge due to the strong electronegativity of fluorine and the high structural stability of C–F bonds. Advanced reduction processes (ARPs) based on strong reducibility of hydrated electrons (eaq) are effective for destroying recalcitrant fluorinated organic pollutants. Ultraviolet (UV) photolysis is a frequently used method for producing eaq, but it is limited by the need for chemical addition and light-shielding effects. This study reported the generation of eaq via electron tunneling based on the n+Si/Al2O3 cathode with a metal–insulator-semiconductor (MIS) structure for the rapid reductive degradation of a halogenated emerging pollutant (florfenicol, FLO). The results demonstrate that the n+Si/Al2O3 cathode achieved 97.5% degradation (30 min), accounting for 92.3% defluorination and 97.0% dechlorination (120 min). The electrogenerated eaq was responsible for the degradation and dehalogenation of FLO, as indicated by electron spin resonance (ESR) measurements, scavenger experiments, and electrochemiluminescence (ECL) tests. The theoretical calculations revealed the occurrence of electron tunneling on the thin Al2O3 film at the n+Si/Al2O3 cathode, where the tunneling electron jumped to the water to form eaq. The ARPs based on electrogenerated eaq also demonstrated efficient degradation of chloramphenicol (CAP), hydroxychloroquine (HCQ), and levofloxacin (LVF). This study not only provides a simple approach to eaq generation via the electron tunneling effect but also suggests a possible strategy for developing ARPs to remove halogenated emerging organic pollutants in water.

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电生水合电子通过电子隧道效应还原降解氟苯尼考
由于氟具有很强的电负性和 C-F 键具有很高的结构稳定性,因此降解含氟有机污染物仍然是一项挑战。基于水合电子(eaq-)强还原性的高级还原过程(ARP)可以有效地破坏难降解的含氟有机污染物。紫外线(UV)光解法是一种常用的生成 eaq- 的方法,但它受到化学添加和光屏蔽效应的限制。本研究报告了基于具有金属-绝缘体-半导体(MIS)结构的 n+Si/Al2O3 阴极通过电子隧道产生 eaq-,用于快速还原降解卤代新污染物(氟苯尼考,FLO)。结果表明,n+Si/Al2O3 阴极的降解率达到了 97.5%(30 分钟),脱氟率为 92.3%,脱氯率为 97.0%(120 分钟)。电子自旋共振(ESR)测量、清除剂实验和电化学发光(ECL)测试表明,电生成的 eaq- 对 FLO 的降解和脱卤起作用。理论计算表明,在 n+Si/Al2O3 阴极的 Al2O3 薄膜上发生了电子隧穿,隧穿电子跃迁到水中形成 eaq-。基于电生 eaq- 的 ARP 还能高效降解氯霉素 (CAP)、羟基氯喹 (HCQ) 和左氧氟沙星 (LVF)。这项研究不仅提供了一种通过电子隧道效应产生 eaq- 的简单方法,还为开发去除水中卤代新有机污染物的 ARP 提出了一种可能的策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS ES&T engineering
ACS ES&T engineering ENGINEERING, ENVIRONMENTAL-
CiteScore
8.50
自引率
0.00%
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0
期刊介绍: ACS ES&T Engineering publishes impactful research and review articles across all realms of environmental technology and engineering, employing a rigorous peer-review process. As a specialized journal, it aims to provide an international platform for research and innovation, inviting contributions on materials technologies, processes, data analytics, and engineering systems that can effectively manage, protect, and remediate air, water, and soil quality, as well as treat wastes and recover resources. The journal encourages research that supports informed decision-making within complex engineered systems and is grounded in mechanistic science and analytics, describing intricate environmental engineering systems. It considers papers presenting novel advancements, spanning from laboratory discovery to field-based application. However, case or demonstration studies lacking significant scientific advancements and technological innovations are not within its scope. Contributions containing experimental and/or theoretical methods, rooted in engineering principles and integrated with knowledge from other disciplines, are welcomed.
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