Bamidele Oluwagbenga Onipede, Matthew Metcalf, Nisha Fletcher, Hui Cai
{"title":"Realizing tunable Fermi level in SnTe by defect control","authors":"Bamidele Oluwagbenga Onipede, Matthew Metcalf, Nisha Fletcher, Hui Cai","doi":"arxiv-2409.08515","DOIUrl":null,"url":null,"abstract":"The tuning of the Fermi level in tin telluride, a topological crystalline\ninsulator, is essential for accessing its unique surface states and optimizing\nits electronic properties for applications such as spintronics and quantum\ncomputing. In this study, we demonstrate that the Fermi level in tin telluride\ncan be effectively modulated by controlling the tin concentration during\nchemical vapor deposition synthesis. By introducing tin-rich conditions, we\nobserved a blue shift in the X-ray photoelectron spectroscopy core-level peaks\nof both tin and tellurium, indicating an upward shift in the Fermi level. This\nshift is corroborated by a decrease in work function values measured via\nultraviolet photoelectron spectroscopy, confirming the suppression of Sn\nvacancies. Our findings provide a low-cost, scalable method to achieve tunable\nFermi levels in tin telluride, offering a significant advancement in the\ndevelopment of materials with tailored electronic properties for\nnext-generation technological applications.","PeriodicalId":501234,"journal":{"name":"arXiv - PHYS - Materials Science","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"arXiv - PHYS - Materials Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/arxiv-2409.08515","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The tuning of the Fermi level in tin telluride, a topological crystalline
insulator, is essential for accessing its unique surface states and optimizing
its electronic properties for applications such as spintronics and quantum
computing. In this study, we demonstrate that the Fermi level in tin telluride
can be effectively modulated by controlling the tin concentration during
chemical vapor deposition synthesis. By introducing tin-rich conditions, we
observed a blue shift in the X-ray photoelectron spectroscopy core-level peaks
of both tin and tellurium, indicating an upward shift in the Fermi level. This
shift is corroborated by a decrease in work function values measured via
ultraviolet photoelectron spectroscopy, confirming the suppression of Sn
vacancies. Our findings provide a low-cost, scalable method to achieve tunable
Fermi levels in tin telluride, offering a significant advancement in the
development of materials with tailored electronic properties for
next-generation technological applications.
碲化锡是一种拓扑晶体绝缘体,调谐碲化锡中的费米级对于获得其独特的表面态以及优化其电子特性以应用于自旋电子学和量子计算等领域至关重要。在这项研究中,我们证明了在化学气相沉积合成过程中通过控制锡浓度可以有效地调制碲化锡的费米级。通过引入富锡条件,我们观察到锡和碲的 X 射线光电子能谱核心级峰都发生了蓝移,这表明费米级发生了上移。通过紫外光电子能谱测量到的功函数值的下降也证实了这一移动,从而证实了锡空位的抑制。我们的研究结果提供了一种低成本、可扩展的方法来实现碲化锡的可调费米级,为开发具有定制电子特性的材料提供了重大进展,可用于下一代技术应用。