Construction of SnO2/Cu2O heterojunctions for enhanced photocatalytic degradation of moxifloxacin

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-12-01 Epub Date: 2024-09-19 DOI:10.1016/j.vacuum.2024.113669

Zongbin Liu , Xiaojiao Yu , Kai Wang , Yuchen Wei , Jian Zhang , Jinfen Niu

引用次数: 0

Abstract

Herein, SnO₂/Cu₂O heterojunction composites were prepared using a hydrothermal method for moxifloxacin removal from water. Cu₂O and SnO₂ were detected in the composite samples, which exhibited between the two semiconductors. The introduction of SnO₂ into pure Cu₂O, forming a heterojunction structure, can enhance device charge conversion, improve photocurrent intensity and photogenerated electron-hole separation efficiency, and greatly improve photocatalytic performance. Moxifloxacin degradation by SnO₂/Cu₂O composites reached 86.4 %. The proposed catalytic mechanism was based on radical scavenging, with •

O_{2}^{‐}

identified as the main active species. In addition, the moxifloxacin degradation intermediates were analyzed, with possible degradation pathways suggested.

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构建二氧化锡/氧化铜异质结以增强莫西沙星的光催化降解能力

本文采用水热法制备了 SnO2/Cu2O 异质结复合材料，用于去除水中的莫西沙星。在复合材料样品中检测到了 Cu2O 和 SnO2，它们介于两种半导体之间。在纯 Cu2O 中引入 SnO2，形成异质结结构，可以增强器件的电荷转换，提高光电流强度和光生电子-空穴分离效率，大大提高光催化性能。SnO2/Cu2O复合材料对莫西沙星的降解率达到86.4%。所提出的催化机理基于自由基清除作用，其中 - O2- 是主要的活性物种。此外，还分析了莫西沙星降解的中间产物，并提出了可能的降解途径。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.