Overall fabrication of uniform BN interphase on 2.5D-SiC fabric via precursor-derived methods

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-10-11 DOI:10.1016/j.vacuum.2024.113727

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Abstract

Boron nitride (BN) interphase plays a crucial role in silicon carbide fiber-reinforced silicon carbide (SiC_f/SiC) composites, because it directly influences the mechanical properties and high-temperature resistance of SiC_f/SiC composites. However, fabricating a high-quality BN interphase on SiC fabrics with low cost and high efficiency remains a significant challenge. In this study, a uniform and dense BN interphase was overally prepared on 2.5D-SiC fabric by precursor-derived method. Whether it is the surface fiber or the inner fiber of the 2.5D-SiC fabric, the interphase thickness remains consistent at 550 ± 30 nm. Moreover, the obtained BN exhibits a lower crystallization temperature (approximately 1200 °C). Additionally, it maintains a strong bond with the fabric after high-temperature treatment at 1600 °C in an argon atmosphere and also retains robust adhesion after high-temperature vacuum treatment at 1600 °C. This study not only presents the overall fabrication of a uniform BN interphase on SiC fabric but also provides a novel strategy for preparing interphases on various types of fabrics.

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通过前驱体衍生方法在 2.5D-SiC 织物上整体制备均匀的 BN 相间体

氮化硼（BN）中间相在碳化硅纤维增强碳化硅（SiCf/SiC）复合材料中起着至关重要的作用，因为它直接影响 SiCf/SiC 复合材料的机械性能和耐高温性能。然而，如何在碳化硅纤维上低成本、高效率地制造出高质量的 BN 中间相仍然是一项重大挑战。本研究采用前驱体衍生法在 2.5D-SiC 织物上制备了均匀致密的 BN 相。无论是 2.5D-SiC 织物的表面纤维还是内部纤维，相间层厚度都保持一致，为 550 ± 30 nm。此外，所获得的 BN 结晶温度较低（约 1200 °C）。此外，在氩气环境中进行 1600 ℃ 高温处理后，它与织物之间仍能保持牢固的粘合力；在 1600 ℃ 高温真空处理后，也能保持牢固的粘合力。这项研究不仅展示了在碳化硅织物上制备均匀 BN 相间物的整体过程，还为在各种类型的织物上制备相间物提供了一种新的策略。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.