Microstructure characterization of plasma electrolytic oxidation coating on Hf-Nb-Ta-Zr high entropy alloy

IF 4.8 2区 材料科学 Q1 MATERIALS SCIENCE, CHARACTERIZATION & TESTING Materials Characterization Pub Date : 2024-09-24 DOI:10.1016/j.matchar.2024.114403
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Abstract

The morphology, composition, and microstructure of plasma electrolytic oxidation (PEO) coating on Hf-Nb-Ta-Zr high entropy alloy (HEA) were characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), Raman spectroscopy, glow discharge optical emission spectroscopy (GDOES) and transmission electron microscopy (TEM). The formation mechanism of PEO coating was analyzed. It was found that a dense PEO coating of ∼4 μm thick on the HEA surface was formed, which consisted of tetragonal and monoclinic ZrO2 phases, tetragonal and monoclinic HfO2 phases, Nb2O5 and Ta2O5 phases. The PEO coating from the alloy substrate to the surface contained five distinctive layers: amorphous barrier layer, nanocrystalline layer, columnar grain layer, amorphous outer layer, and top porous layer. Their formation was ascribed to the different cooling rates of the melt in the different depths of the discharge channel across the coating. Meanwhile, the formation of an amorphous barrier layer near the HEA substrate was also related to the mutual migration and diffusion of Hf4+, Nb5+, Ta5+, Zr4+ and O2− besides the rapid cooling of melt in the bottom of the discharge channel. The columnar grains of ∼70 nm wide were mainly composed of the monoclinic ZrO2 and monoclinic HfO2 phases, but both the amorphous layers enrich the Ta and Nb elements. It was believed that the high-content Ta and Nb in the HEA enhanced the formation of the amorphous layers.

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Hf-Nb-Ta-Zr 高熵合金等离子电解氧化涂层的微观结构表征
采用扫描电子显微镜(SEM)、X射线光电子能谱(XPS)、X射线衍射(XRD)、拉曼光谱、辉光放电光发射光谱(GDOES)和透射电子显微镜(TEM)对Hf-Nb-Ta-Zr高熵合金(HEA)上等离子体电解氧化(PEO)涂层的形貌、成分和微观结构进行了表征。分析了 PEO 涂层的形成机理。研究发现,在 HEA 表面形成了厚度为 4 μm 的致密 PEO 涂层,由四方和单斜 ZrO2 相、四方和单斜 HfO2 相、Nb2O5 和 Ta2O5 相组成。从合金基体到表面的 PEO 涂层包含五个不同的层,即非晶阻挡层、纳米晶层、柱状晶粒层、非晶外层和顶部多孔层。它们的形成是由于熔体在涂层上不同深度的放电通道中的冷却速度不同。同时,HEA 基底附近非晶阻挡层的形成除了与放电通道底部熔体的快速冷却有关外,还与 Hf4+、Nb5+、Ta5+、Zr4+ 和 O2- 的相互迁移和扩散有关。宽度为 70 nm 的柱状晶粒主要由单斜 ZrO2 和单斜 HfO2 相组成,但非晶层中都富含 Ta 和 Nb 元素。据认为,HEA 中的高含量 Ta 和 Nb 促进了非晶层的形成。
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来源期刊
Materials Characterization
Materials Characterization 工程技术-材料科学:表征与测试
CiteScore
7.60
自引率
8.50%
发文量
746
审稿时长
36 days
期刊介绍: Materials Characterization features original articles and state-of-the-art reviews on theoretical and practical aspects of the structure and behaviour of materials. The Journal focuses on all characterization techniques, including all forms of microscopy (light, electron, acoustic, etc.,) and analysis (especially microanalysis and surface analytical techniques). Developments in both this wide range of techniques and their application to the quantification of the microstructure of materials are essential facets of the Journal. The Journal provides the Materials Scientist/Engineer with up-to-date information on many types of materials with an underlying theme of explaining the behavior of materials using novel approaches. Materials covered by the journal include: Metals & Alloys Ceramics Nanomaterials Biomedical materials Optical materials Composites Natural Materials.
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