Mechanical property improvement of diffusion bonded ZrCx joints by chemical homogenization using Ta as the interlayer

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2024-09-25 DOI:10.1016/j.vacuum.2024.113684
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Abstract

In the present study, a transition metal Ta foil was used as the interlayer to diffusion bond ZrCx ceramics. A needle-like ζ-Ta4C3-x phase was initially formed at the interface and could be effectively dissolved into the base ceramic by reasonably tuning the bonding temperature and holding time, resulting in a chemically homogeneous joint when diffusion bonded at 1600 °C for 1 h under 20 MPa pressure. The composition of the homogeneous joints was composed of ZrCx(Ta), which is very similar to the base ceramic. The ζ-Ta4C3-x phase was found beneficial to the mechanical property of the joints due to its mechanically interlocking effect and the ability to absorb the propagation energy of microcracks. The chemically homogeneous joint had comparable four-point bending strength and nano-indentation hardness with that of the base ceramic, indicating that chemical homogenization of the joint has great potential to enhance the mechanical property of the ZrCx joints.
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使用 Ta 作为中间层,通过化学均匀化改善扩散粘接 ZrCx 接头的机械性能
在本研究中,过渡金属 Ta 箔被用作扩散粘合 ZrCx 陶瓷的中间层。界面上最初形成了针状的 ζ-Ta4C3-x 相,通过合理调节键合温度和保温时间,可有效地将其溶解到基底陶瓷中,从而在 20 兆帕压力下于 1600 ℃ 扩散键合 1 小时后形成化学均匀的接合点。均质接头的成分是 ZrCx(Ta),与基底陶瓷非常相似。由于ζ-Ta4C3-x 相具有机械互锁效应和吸收微裂纹扩展能量的能力,因此有利于提高接缝的机械性能。化学均质接头的四点弯曲强度和纳米压痕硬度与基底陶瓷相当,这表明接头的化学均质化在提高 ZrCx 接头的机械性能方面具有巨大潜力。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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