Bingbing Teng, Chen Jiang, Zhenyu Jiang, Hui Ye, Shiwei Xu
{"title":"Enhanced material removal modeling in cylindrical bonnet tool polishing: Incorporating time-dependent pad wear effects","authors":"Bingbing Teng, Chen Jiang, Zhenyu Jiang, Hui Ye, Shiwei Xu","doi":"10.1016/j.precisioneng.2024.09.027","DOIUrl":null,"url":null,"abstract":"<div><div>To enhance the accuracy and stability of the material removal model for cylindrical bonnet tool polishing (CBTP), this study introduces a model incorporating the time-varying wear effect of the polishing pad. Initially, the functional principles of the CBTP method are systematically outlined. An advanced material removal model is then proposed, which accounts for the impact of pad wear on pressure and velocity distributions within the contact area. Experimental methods were employed to explore how pad wear affects the pad surface morphology, polishing quality, and material removal rates. Findings reveal that pad wear considerably influences both the depth of material removal and the quality of the polished surface. Validation experiments demonstrate that the enhanced model is accurate and stable. Including the time-varying factor, the discrepancy between the predicted and experimental values of the polishing spot size was 9.29 %, while the accuracy of the predicted material removal depth reached 90.74 %. Additionally, the removal profiles generated by the improved model closely matched those observed experimentally.</div></div>","PeriodicalId":54589,"journal":{"name":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","volume":"91 ","pages":"Pages 336-343"},"PeriodicalIF":3.5000,"publicationDate":"2024-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0141635924002277","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0
Abstract
To enhance the accuracy and stability of the material removal model for cylindrical bonnet tool polishing (CBTP), this study introduces a model incorporating the time-varying wear effect of the polishing pad. Initially, the functional principles of the CBTP method are systematically outlined. An advanced material removal model is then proposed, which accounts for the impact of pad wear on pressure and velocity distributions within the contact area. Experimental methods were employed to explore how pad wear affects the pad surface morphology, polishing quality, and material removal rates. Findings reveal that pad wear considerably influences both the depth of material removal and the quality of the polished surface. Validation experiments demonstrate that the enhanced model is accurate and stable. Including the time-varying factor, the discrepancy between the predicted and experimental values of the polishing spot size was 9.29 %, while the accuracy of the predicted material removal depth reached 90.74 %. Additionally, the removal profiles generated by the improved model closely matched those observed experimentally.
期刊介绍:
Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.