Preparation of CIP@Fe3O4 particles and their impact on the fenton reaction processing performance of single-crystal SiC

IF 5.3 1区 工程技术 Q1 ENGINEERING, MECHANICAL Wear Pub Date : 2024-10-10 DOI:10.1016/j.wear.2024.205590
Da Hu , Jiabin Lu , Yuhang Jin , Huilong Li , Qiusheng Yan
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Abstract

This study proposes the preparation of CIP@Fe3O4 composite magnetic particles, which maintain excellent magnetic properties while exhibiting superior Fenton reaction performance for the magnetorheological chemical polishing of single-crystal SiC. The CIP@Fe3O4 particles were prepared by coating a nanoscale layer of Fe3O4 onto micron-sized carbonyl iron powder (CIP) using the co-precipitation method. Their Fenton reaction performance and magnetic properties were characterized, and CIP@Fe3O4 was used as a solid-phase catalyst in Fenton reaction-induced etching, frictional wear, and polishing experiments on single-crystal SiC. The prepared CIP@Fe3O4 particles have a saturation magnetization of 184.3 emu/g, representing only an 8.7 % reduction compared to CIP, yet achieved a decolorization rate of 76.2 % for the methyl orange indicator (compared to only 17.2 % with CIP alone). The Fenton reaction using CIP@Fe3O4 resulted in a prominent corrosion layer on the surface of single-crystal SiC, with the oxygen atomic fraction reaching 22.15 %. The study examined material removal from SiC under Fenton reactions with different solid-phase catalysts: CIP, CIP@Fe3O4, and CIP + Fe3O4. Frictional wear results indicated that the maximum scratch cross-sectional removal area on the SiC surface under the Fenton reaction with CIP@Fe3O4 was 474.38 μm2, representing a 207.3 % increase compared to without the Fenton reaction. Additionally, Si-O compounds were identified in the debris. Polishing experiments showed that the material removal rate (MRR) with the Fenton reaction was 3295 nm/h, an increase of 220.2 % compared to without the Fenton reaction, and the surface roughness was reduced to Ra 0.895 nm, a 73.4 % reduction compared to without the Fenton reaction. This study provides additional evidence for the application of magnetorheological technology and the Fenton reaction in the polishing field of single-crystal SiC.
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CIP@Fe3O4 颗粒的制备及其对单晶碳化硅芬顿反应加工性能的影响
本研究提出了 CIP@Fe3O4 复合磁性颗粒的制备方法,这种颗粒既能保持优异的磁性能,又能表现出卓越的芬顿反应性能,可用于单晶 SiC 的磁流变化学抛光。CIP@Fe3O4 颗粒是通过共沉淀法在微米级羰基铁粉(CIP)上包覆一层纳米级的 Fe3O4 制备而成的。将 CIP@Fe3O4 作为固相催化剂用于 Fenton 反应诱导的单晶 SiC 蚀刻、摩擦磨损和抛光实验。制备的 CIP@Fe3O4 颗粒的饱和磁化率为 184.3 emu/g,与 CIP 相比仅降低了 8.7%,但对甲基橙指示剂的脱色率却达到了 76.2%(而单独使用 CIP 时仅为 17.2%)。使用 CIP@Fe3O4 进行芬顿反应后,单晶 SiC 表面出现了明显的腐蚀层,氧原子分数达到 22.15%。该研究考察了使用不同固相催化剂进行 Fenton 反应时 SiC 材料的去除情况:CIP、CIP@Fe3O4 和 CIP + Fe3O4。摩擦磨损结果表明,在使用 CIP@Fe3O4 的 Fenton 反应中,SiC 表面的最大划痕截面去除面积为 474.38 μm2,比未使用 Fenton 反应时增加了 207.3%。此外,在碎片中还发现了 Si-O 化合物。抛光实验表明,使用 Fenton 反应的材料去除率 (MRR) 为 3295 nm/h,与未使用 Fenton 反应的材料去除率相比提高了 220.2%,表面粗糙度降低到 Ra 0.895 nm,与未使用 Fenton 反应的材料去除率相比降低了 73.4%。这项研究为磁流变技术和 Fenton 反应在单晶碳化硅抛光领域的应用提供了更多证据。
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来源期刊
Wear
Wear 工程技术-材料科学:综合
CiteScore
8.80
自引率
8.00%
发文量
280
审稿时长
47 days
期刊介绍: Wear journal is dedicated to the advancement of basic and applied knowledge concerning the nature of wear of materials. Broadly, topics of interest range from development of fundamental understanding of the mechanisms of wear to innovative solutions to practical engineering problems. Authors of experimental studies are expected to comment on the repeatability of the data, and whenever possible, conduct multiple measurements under similar testing conditions. Further, Wear embraces the highest standards of professional ethics, and the detection of matching content, either in written or graphical form, from other publications by the current authors or by others, may result in rejection.
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