Comparative Analysis of Structural, Optical, and Electronic Properties of Nickel Oxide and Potassium-Doped Nickel Oxide Nanocrystals

Energy Storage Pub Date : 2024-11-03 DOI:10.1002/est2.70065
Karishma, Neeti Tripathi, Ratnesh Kumar Pandey, Ambuj Tripathi, K. Asokan, Vishal Bhushan, Vikas Sharma
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Abstract

Metal oxide semiconductors, known for their exceptional optical transparency, high carrier mobility, and stability, have found extensive use in emerging technologies such as optoelectronics and energy storage devices. Among all metal oxide semiconductors, nickel oxide (NiO) stands out as a highly favorable candidate due to its p-type conductivity along with its substantial band gap (3.5–4 eV) for the broad range of applications, including gas sensors, high-rate Lithium-ion batteries, high-performance supercapacitors, and photovoltaic devices. In light of these versatile applications, our current study presents a comprehensive comparative analysis of the structural and optoelectronic properties of NiO and potassium (K)-doped NiO nanocrystals. The nanocrystals were synthesized using the co-precipitation route and subsequently annealed at 500°C under ambient conditions. The effect of K doping on the structural and optoelectronic characteristics was systematically examined using various techniques, including x-ray diffraction, UV–visible spectroscopy, Raman spectroscopy, and Hall effect measurements. To explore the structural characteristics, XRD measurements were performed, which confirm the FCC structure of nanocrystals. The optical property analysis suggested that the formation of the energy level can contribute to reduction of the band gap. A sharp peak at 397 cm−1 is associated with NiO bond in FTIR spectra which verifies the formation of nanocrystals. Moreover, the incorporation of K increases the intensity of the Raman peaks, which provides evidence for the higher degree of crystallinity in doped samples. These results of Raman scattering are in good agreement with XRD outcomes. In addition, the resistivity of NiO nanocrystals decreases monotonically with the increasing K concentration. The results of temperature-dependent resistivity further demonstrate that electrons required more energy to jump from one polaron state to another in the case of x = 0.01 M and 0.03 M doped Ni0.5-xKxO samples. The combination of a diminished band gap and enhanced conductivity makes these materials exceptionally promising for applications in optoelectronics and energy storage.

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氧化镍和掺钾氧化镍纳米晶体的结构、光学和电子特性对比分析
金属氧化物半导体以其卓越的光学透明度、高载流子迁移率和稳定性而著称,在光电子学和储能设备等新兴技术中得到广泛应用。在所有金属氧化物半导体中,氧化镍(NiO)因其 p 型导电性和可观的带隙(3.5-4 eV)而成为非常有利的候选材料,可广泛应用于气体传感器、高倍率锂离子电池、高性能超级电容器和光伏设备等领域。鉴于这些广泛的应用,我们目前的研究对氧化镍和钾(K)掺杂氧化镍纳米晶体的结构和光电特性进行了全面的比较分析。纳米晶体采用共沉淀法合成,随后在 500°C 环境条件下退火。利用各种技术,包括 X 射线衍射、紫外-可见光谱、拉曼光谱和霍尔效应测量,系统地研究了掺杂 K 对结构和光电特性的影响。为了探索结构特征,进行了 X 射线衍射测量,结果证实了纳米晶体的 FCC 结构。光学特性分析表明,能级的形成有助于降低带隙。傅立叶变换红外光谱中 397 cm-1 处的尖锐峰与 NiO 键有关,验证了纳米晶体的形成。此外,K 的加入增加了拉曼峰的强度,这证明了掺杂样品的结晶度更高。这些拉曼散射结果与 XRD 结果非常吻合。此外,NiO 纳米晶体的电阻率随 K 浓度的增加而单调降低。电阻率随温度变化的结果进一步表明,在 x = 0.01 M 和 0.03 M 掺杂 Ni0.5-xKxO 样品中,电子从一个极子态跃迁到另一个极子态需要更多的能量。带隙减小与电导率增强的结合使这些材料在光电和储能领域的应用前景异常广阔。
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