In‐Device Ballistic‐Electron‐Emission Spectroscopy for Accurately In Situ Mapping Energy Level Alignment at Metal–Organic Semiconductors Interface

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Advanced Materials Pub Date : 2024-11-11 DOI:10.1002/adma.202412758
Ke Meng, Ruiheng Zheng, Xianrong Gu, Rui Zhang, Lidan Guo, Yang Qin, Tingting Yang, Min Li, Shunhua Hu, Cheng Zhang, Meng Wu, Ankang Guo, Xueli Yang, Jianqi Zhang, Xiangnan Sun
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Abstract

Energy level alignment at metal/organic semiconductors (OSCs) interface governs electronic processes in organic electronics devices, making its precise determination essential for understanding carrier transport behaviors and optimizing device performance. However, it is proven that accurately characterizing the energy barrier at metal/OSC interface under operational conditions remains challenging due to the technical limitations of traditional methods. Herein, through integrating highly‐improved device constructions with an ingenious derivative‐assisted data processing method, this study demonstrates an in‐device ballistic‐electron‐emission spectroscopy using hot‐electron transistors to accurately characterize the energy barrier at metal/OSC interface under in‐operando conditions. This technique is found that a remarkable improvement in measurement accuracy, reaching up to ±0.03 eV, can be achieved—surpassing previous techniques (±0.1–0.2 eV). The high accuracy allows us to monitor subtle changes in energy barriers at metal/OSC interface caused by variations in the aggregation state of OSCs, a phenomenon that is theoretically possible but failed to be directly demonstrated through conventional methods. Moreover, this study makes demonstration that this technology is universally applicable to various metal/OSC interfaces consisting of electron‐transporting, hole‐transporting, and ambipolar OSCs. These findings manifest the great potential of this method to advance both theoretical exploration and technical applications in organic electronics.
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利用器件内弹道电子发射光谱准确地现场绘制金属有机半导体界面能级排列图
金属/有机半导体(OSCs)界面的能级排列控制着有机电子器件的电子过程,因此精确测定能级排列对于理解载流子传输行为和优化器件性能至关重要。然而,事实证明,由于传统方法的技术限制,在操作条件下准确表征金属/有机半导体界面的能障仍然具有挑战性。在此,本研究通过将高度改进的器件结构与巧妙的导数辅助数据处理方法相结合,利用热电子晶体管展示了一种器件内弹道电子发射光谱,以准确表征工作条件下金属/OSC 接口的能垒。研究发现,这种技术可以显著提高测量精度,最高可达 ±0.03 eV,超过了以往的技术(±0.1-0.2 eV)。高精度使我们能够监测 OSC 聚集状态变化引起的金属/OSC 界面能垒的微妙变化,这种现象在理论上是可能的,但却无法通过传统方法直接证明。此外,这项研究还证明,这项技术普遍适用于由电子传输、空穴传输和双极 OSCs 组成的各种金属/OSC 接口。这些发现表明,这种方法在推进有机电子学的理论探索和技术应用方面具有巨大潜力。
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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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