Removal of diclofenac sodium from simulated wastewater through an optimized plasma technology system synergized with activated carbon and persulfate

IF 3.8 3区 工程技术 Q3 ENERGY & FUELS Chemical Engineering and Processing - Process Intensification Pub Date : 2024-11-10 DOI:10.1016/j.cep.2024.110068
Jia-Wei Song , Jia Bao , Yang Liu , Xin Wang , Qing-Xin Shen
{"title":"Removal of diclofenac sodium from simulated wastewater through an optimized plasma technology system synergized with activated carbon and persulfate","authors":"Jia-Wei Song ,&nbsp;Jia Bao ,&nbsp;Yang Liu ,&nbsp;Xin Wang ,&nbsp;Qing-Xin Shen","doi":"10.1016/j.cep.2024.110068","DOIUrl":null,"url":null,"abstract":"<div><div>Diclofenac sodium (DCF) has received much attention due to the contaminations associated with its frequent usage. Current technologies for DCF removal from wastewater have presented higher energy consumption and lower cost efficiency, thus efficient removal of DCF without secondary pollution would be required. In this study, removal of DCF by plasma technology was modeled and optimized via the response surface methodology (RSM). The DCF removal rate could reach 66.3 % after a treatment of 60 min when the voltage was 12.7 kV, the discharge gap was 15 mm, and the number of discharge needles was 5. Subsequently, further addition of granular activated carbon (GAC) and persulfate (PS) enhanced the removal of DCF through the construction of an optimized plasma/GAC/PS system. The improved removal rate of DCF could rise to 90.4 %, when GAC was 2 g/L and PS was 2 mmol/L under the optimal conditions of RSM. Based upon the analysis of UPLC-QTOF-MS/MS and UV–vis and free radical quenching, the removal of DCF in the plasma/GAC/PS system mainly relied on the attack of •OH and SO<sub>4</sub><sup>•⁻</sup> on the benzene ring, involving the C<img>N breakage of DCF and the generation of by-products. Finally, residual toxicity and cost of the DCF treatment were evaluated.</div></div>","PeriodicalId":9929,"journal":{"name":"Chemical Engineering and Processing - Process Intensification","volume":"206 ","pages":"Article 110068"},"PeriodicalIF":3.8000,"publicationDate":"2024-11-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Engineering and Processing - Process Intensification","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0255270124004069","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENERGY & FUELS","Score":null,"Total":0}
引用次数: 0

Abstract

Diclofenac sodium (DCF) has received much attention due to the contaminations associated with its frequent usage. Current technologies for DCF removal from wastewater have presented higher energy consumption and lower cost efficiency, thus efficient removal of DCF without secondary pollution would be required. In this study, removal of DCF by plasma technology was modeled and optimized via the response surface methodology (RSM). The DCF removal rate could reach 66.3 % after a treatment of 60 min when the voltage was 12.7 kV, the discharge gap was 15 mm, and the number of discharge needles was 5. Subsequently, further addition of granular activated carbon (GAC) and persulfate (PS) enhanced the removal of DCF through the construction of an optimized plasma/GAC/PS system. The improved removal rate of DCF could rise to 90.4 %, when GAC was 2 g/L and PS was 2 mmol/L under the optimal conditions of RSM. Based upon the analysis of UPLC-QTOF-MS/MS and UV–vis and free radical quenching, the removal of DCF in the plasma/GAC/PS system mainly relied on the attack of •OH and SO4•⁻ on the benzene ring, involving the CN breakage of DCF and the generation of by-products. Finally, residual toxicity and cost of the DCF treatment were evaluated.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
通过与活性炭和过硫酸盐协同作用的优化等离子体技术系统去除模拟废水中的双氯芬酸钠
由于双氯芬酸钠(DCF)的频繁使用会造成污染,因此受到了广泛关注。目前从废水中去除 DCF 的技术能耗较高,成本效益较低,因此需要在不造成二次污染的情况下高效去除 DCF。本研究通过响应面法(RSM)对等离子体技术去除 DCF 进行了建模和优化。在电压为 12.7 kV、放电间隙为 15 mm、放电针数为 5 的情况下,处理 60 分钟后 DCF 的去除率可达 66.3%。 随后,通过构建优化的等离子体/GAC/PS 系统,进一步添加颗粒活性炭(GAC)和过硫酸盐(PS),提高了 DCF 的去除率。在 RSM 的最佳条件下,当 GAC 为 2 g/L 和 PS 为 2 mmol/L 时,DCF 的去除率可提高到 90.4%。根据 UPLC-QTOF-MS/MS 和 UV-vis 分析以及自由基淬灭分析,等离子体/GAC/PS 系统对 DCF 的去除主要依赖于 -OH 和 SO4- 对苯环的攻击,涉及 DCF 的 CN 断裂和副产物的生成。最后,对 DCF 处理的残留毒性和成本进行了评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
CiteScore
7.80
自引率
9.30%
发文量
408
审稿时长
49 days
期刊介绍: Chemical Engineering and Processing: Process Intensification is intended for practicing researchers in industry and academia, working in the field of Process Engineering and related to the subject of Process Intensification.Articles published in the Journal demonstrate how novel discoveries, developments and theories in the field of Process Engineering and in particular Process Intensification may be used for analysis and design of innovative equipment and processing methods with substantially improved sustainability, efficiency and environmental performance.
期刊最新文献
Valorization of peach (Prunus persica L.) peels and seeds using ultrasound and enzymatic methods Enhancing the extraction of germanium from zinc oxide dust through microwave roasting and the underlying mechanism Removal of diclofenac sodium from simulated wastewater through an optimized plasma technology system synergized with activated carbon and persulfate Production of calcium and magnesium titanates using concentrated solar energy Influence of high-speed jet on the particle distributions in downer
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1