Ningxin Wei , Hang Li , Jianliang Li , Jiewen Huang , Jian Kong , Qiujie Wu , Huaping Tan , Yan Shi , Dangsheng Xiong
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引用次数: 0
Abstract
Doping with non-metal element is effective to improve the porous morphology and enhance the mechanical and tribological properties of transition metal dichalcogenides (TMDs) based film. However, the mechanical properties of TMDs based film with single additive should be enhanced further for better wear resistance. In this work, B/N dual-doping was used to further enhance the deformation resistance and toughness of MoS2 based films deposited by magnetron sputtering, while the effect of B/N dopants on the structure, mechanical and tribological properties has been investigated. Mo-S-B-N film with B content of 20.91 at. % and N content of 18.13 at. % consists of MoS2 and amorphous nitride/boride, in which B/N dual doping film forms a higher ordered MoS2 lamellar structure compared to B doping film. With a hardness of 11.6 ± 0.9 GPa and improved toughness, the film achieves a low wear rate and average friction coefficient is achieved. Comparing B/N dual doping film to B doping film, the stable formation of tribolayer with more strengthened deformation resistance results in the steady friction and the improved wear resistance, while the limited TMDs reorientation leads to the slight increase of friction coefficient.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.