Ioannis A. Poimenidis , Michalis Liapakis , Argyro Klini , Maria Farsari , Stavros D. Moustaizis , Michalis Konsolakis , Panagiotis A. Loukakos
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引用次数: 0
Abstract
A pioneering laboratory apparatus of physical vapor deposition (PVD) for thin film fabrication is herein introduced. This innovative setup harnesses high-frequency currents (Eddy currents) and a Zero-Voltage Switching (ZVS) heater to sublimate the sacrificial material. The as-fabricated system offers low energy consumption and fast deposition time, leading to the formation and growth of thin films in various thicknesses. To reveal its effectiveness, Cu thin films were deposited on Si wafers. Morphological, structural, and surface profile characterizations confirmed the growth of thin films consisting of Cu nanoparticles. Also, a parametric study of deposition time was conducted to determine the optimum conditions for the thin film fabrication.
期刊介绍：
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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