Development of a high-intensity compact D-D neutron generator based on RF ion sources

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-02-01 Epub Date: 2024-11-30 DOI:10.1016/j.vacuum.2024.113909
Zhenqing Zhu , Yuzhong Qian , Mengmeng Li , Xin Tao , Bing Hong , Jichao Wang , Jiasheng Chen , Wei Xu , Xiancai Meng , Lizhen Liang , Chundong Hu
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Abstract

The present paper presents a compact D-D neutron generator designed for imaging applications, capable of producing a neutron yield exceeding 109n/s. Here, a RF ion source ignited by an external antenna is envisaged, and the discharge chamber's design involves a double-layer glass cylinder for active cooling of the discharge chamber. At the same time, by improving the chamber's size and strategically positioning the magnetic field outside -multi-cusp and top magnetic field, the efficiency of the ion source is enhanced, including increased the extract beam current and extended ion source life, thus fostering increased neutron production and prolonged service duration. The experimental results show that under the condition of RF power 400 W and high voltage negative 95 kV, the beam current is extracted by 9.5 mA, and the stable operation of 24 h is realized, which the neutron yield reaches 1.1 × 109 n/s with effective operation time surpassing 95 %.
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基于射频离子源的高强度紧凑D-D中子发生器的研制
本文介绍了一种用于成像应用的紧凑的D-D中子发生器,能够产生超过109n/s的中子产率。在这里,设想了一个由外部天线点燃的射频离子源,放电室的设计包括一个双层玻璃圆柱体,用于放电室的主动冷却。同时,通过改进腔室的尺寸,将磁场战略性地定位在多尖端和顶部磁场之外,提高了离子源的效率,包括提高了提取束电流,延长了离子源寿命,从而提高了中子产量,延长了使用寿命。实验结果表明,在射频功率为400 W、高压为负95 kV的条件下,提取束流9.5 mA,实现了24 h的稳定运行,中子产率达到1.1 × 109 n/s,有效运行时间超过95%。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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