Characterization of LDMOS down to cryogenic temperatures and modeling with PSPHV

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Solid-state Electronics Pub Date : 2025-01-01 Epub Date: 2024-11-19 DOI:10.1016/j.sse.2024.109029
Yili Wang , Kejun Xia , Guofu Niu , Michael Hamilton , Xu Cheng
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Abstract

This article presents a detailed characterization and analysis of a 45 V LDMOS device from production technology across a wide temperature range from 33 to 385 K. For the first time, quasi-saturation behavior is consistently observed throughout the entire temperature range studied. Compared to prior published data, this device shows some notable differences, including a substantially higher saturation temperature of around 200 K for threshold voltage and subthreshold swing due to band tail and a typical low on-resistance down to 33 K, free of freezeout. To account for the observed temperature dependencies, we propose improved semi-empirical temperature scaling equations for the PSPHV model. We extend its applicable temperature range down to 33 K from the previous lower limit of 240 K. The enhancement models the temperature behaviors of key device parameters, including threshold voltage, subthreshold swing, mobility, velocity saturation, drift resistance, and quasi-saturation effects. These results provide new insights into the low-temperature behavior of LDMOS devices for cryogenic electronics applications.
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低至低温的 LDMOS 特性及 PSPHV 建模
本文详细描述和分析了采用生产技术的 45 V LDMOS 器件在 33 至 385 K 宽温度范围内的特性。与之前公布的数据相比,该器件显示出一些显著差异,包括由于带尾效应,阈值电压和阈下摆动的饱和温度大大高于 200 K 左右,以及典型的低导通电阻(低至 33 K),无冻结现象。为了解释观察到的温度依赖性,我们为 PSPHV 模型提出了改进的半经验温度比例方程。我们将其适用的温度范围从以前的下限 240 K 扩展到 33 K。改进后的模型可模拟关键器件参数的温度行为,包括阈值电压、亚阈值摆幅、迁移率、速度饱和、漂移电阻和准饱和效应。这些结果为低温电子应用中 LDMOS 器件的低温行为提供了新的见解。
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来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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