Anat Karlin , Michal Sakajio , Meirav Mann-Lahav , Gennady E. Shter , Shai Zamir , Gideon S. Grader
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引用次数: 0
Abstract
High gradient insulators (HGI) consisting of ceramic and metallic alternating layer structure, have been shown to reduce surface breakdown occurrence in high voltage devices. Recently, the HGI's metal layers were replaced with high dielectric constant ceramics, creating dielectric high gradient insulators (DHGI) that were shown to outperform pure alumina analog. A 2-layer DHGI prototype manufactured by spark plasma sintering (SPS) demonstrated an increased surface breakdown field and fewer surface breakdowns during conditioning, compared to plain alumina. However, weak breakdowns at the opposite polarity were observed in the 2-layer structure. This study focuses on overcoming this issue by introducing a 3-layer design, with two high dielectric layers capping a plain alumina layer. Breakdown tests confirmed the elimination of weak breakdowns and improved dielectric strength, consistent with simulations predictions. Additionally, post-SPS air annealing was shown to be essential for removing adsorbed gases and recovering the high dielectric layers composition that changed during SPS. The annealed DHGIs were shown to reduce significantly the breakdown pulses during high-voltage conditioning. The 3-layer DHGI exhibited a 33.5 % higher breakdown field than plain alumina and a 13.5 % improvement over the 2-layer DHGI reported earlier.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.