Effective substitution of La3+ on the NiO crystal structure for the augmentation of photocatalytic tetracycline and Congo red degradation

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2024-11-25 DOI:10.1007/s10854-024-13896-4
C. Udayakumar, J. Arunkumar, P. Devisowjanya, Amanullah Fatehmulla
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Abstract

In this study, different concentrations of La3+-substituted NiO nanocatalysts were synthesized through a simple precipitation technique and characterized well with sophisticated instruments. The photocatalytic activity of the La-NiO-1.5% catalyst was substantially higher than that of pristine, 0.5%, 1%, and 2% La3+-substituted NiO samples for the degradation of tetracycline antibiotic pollutant (84.3%) and Congo red aqueous dye (90.2%). The increased efficiency could be attributed to a decrease in photo-induced electron–hole recombination rate by the formation of the La3+ inner energy state. The recycling tests show that the La-NiO-1.5% samples have excellent stability for both CR and TC aqueous pollutant degradation, and the scavenging analysis shows that the \(\cdot {\text{O}}^{2-}\) and \(\cdot \text{OH}\) radicals are the primary active radicals for degradation. The possible photocatalytic reaction mechanism was established by the characterization findings.

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在氧化镍晶体结构上有效取代 La3+ 以增强光催化降解四环素和刚果红的能力
本研究通过简单的沉淀技术合成了不同浓度的 La3+ 取代 NiO 纳米催化剂,并利用精密仪器对其进行了表征。在降解四环素类抗生素污染物(84.3%)和刚果红水性染料(90.2%)时,La-NiO-1.5%催化剂的光催化活性大大高于原始、0.5%、1%和 2% La3+ 取代的 NiO 样品。效率的提高可归因于 La3+ 内能态的形成降低了光诱导的电子-空穴重组率。循环测试表明,La-NiO-1.5%样品对CR和TC水污染物的降解都具有良好的稳定性,清除分析表明,\(\cdot {text{O}}^{2-}\) 和\(\cdot \text{OH}\) 自由基是降解的主要活性自由基。表征结果确定了可能的光催化反应机制。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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