Microelectronic Structure and Doping Nonuniformity of Phosphorus-Doped CdSeTe Solar Cells.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-06 DOI:10.1021/acsami.4c15741
Chun-Sheng Jiang, Rouin Farshchi, Timothy Nagle, Dingyuan Lu, Gang Xiong, Lorelle M Mansfield, Matthew O Reese
{"title":"Microelectronic Structure and Doping Nonuniformity of Phosphorus-Doped CdSeTe Solar Cells.","authors":"Chun-Sheng Jiang, Rouin Farshchi, Timothy Nagle, Dingyuan Lu, Gang Xiong, Lorelle M Mansfield, Matthew O Reese","doi":"10.1021/acsami.4c15741","DOIUrl":null,"url":null,"abstract":"<p><p>Optimizing group-V doping and Se alloying are two main focuses for advancing CdTe photovoltaic technology. We report on nanometer-scale characterizations of microelectronic structures of phosphorus (P)-doped CdSeTe devices using a combination of two atomic force microscopy-based techniques, namely, Kelvin probe force microscopy (KPFM) and scanning spreading resistance microscopy (SSRM). KPFM on device cross-section images distribution of the potential drop across the device. SSRM taken on a delaminated front interface and further beveling into absorber bulk reveals local distributions of doping polarity and carrier concentration. The KPFM and SSRM imaging corroborate each other, suggesting that nonuniform doping revealed by SSRM is associated with nonuniform potential features observed by KPFM. These detrimental microelectronic structures were improved by enhancing P-doping. The large nonuniform potential drop and deep overall n-p transition in the device without doping were mitigated to potential fluctuation around the front interface and n-p transition depth of ∼100 nm by low-level P-doping and further mitigated to scarce and slight irregular potential and p-weighed doping at the interface by high-level P-doping. These characterizations imply sophisticated defect chemistry, atomic structure, and associated electronic structure in CdTe with Se alloying and group-V doping together and further point to the direction for improving device efficiency by mitigating and ultimately eliminating the nonuniform doping and irregular potential.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":" ","pages":""},"PeriodicalIF":8.3000,"publicationDate":"2025-01-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.4c15741","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Optimizing group-V doping and Se alloying are two main focuses for advancing CdTe photovoltaic technology. We report on nanometer-scale characterizations of microelectronic structures of phosphorus (P)-doped CdSeTe devices using a combination of two atomic force microscopy-based techniques, namely, Kelvin probe force microscopy (KPFM) and scanning spreading resistance microscopy (SSRM). KPFM on device cross-section images distribution of the potential drop across the device. SSRM taken on a delaminated front interface and further beveling into absorber bulk reveals local distributions of doping polarity and carrier concentration. The KPFM and SSRM imaging corroborate each other, suggesting that nonuniform doping revealed by SSRM is associated with nonuniform potential features observed by KPFM. These detrimental microelectronic structures were improved by enhancing P-doping. The large nonuniform potential drop and deep overall n-p transition in the device without doping were mitigated to potential fluctuation around the front interface and n-p transition depth of ∼100 nm by low-level P-doping and further mitigated to scarce and slight irregular potential and p-weighed doping at the interface by high-level P-doping. These characterizations imply sophisticated defect chemistry, atomic structure, and associated electronic structure in CdTe with Se alloying and group-V doping together and further point to the direction for improving device efficiency by mitigating and ultimately eliminating the nonuniform doping and irregular potential.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
求助全文
约1分钟内获得全文 去求助
来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
期刊最新文献
Hydrogel-Gated MXene-Graphene Field-Effect Transistor for Selective Detection and Screening of SARS-CoV-2 and E. coli Bacteria Cost-Effective Electrode Fabrication Method Using Hydroxypropyl Methylcellulose Binder for Proton Exchange Membrane Water Electrolysis Impact of Glycosylation of Apolipoprotein D on Its Interaction with Gold Nanoparticles: Insights from Molecular Dynamics Simulations Developing a Novel Agrochemical-Based MOF: A Multifunctional Platform with Herbicidal and Antibacterial Activities Two-Component Hydrogels Built from Chinese Herbal Medicine-Derived Glycyrrhizic Acid and Puerarin: Assembly Mechanism, Self-Healing Properties, and Selective Antibacterial Activity
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1