Post-Germination Growth Stimulation in Mustard Greens (Brassica juncea L.) by Gaseous Products from Air Plasma Discharge

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-10-04 DOI:10.1007/s11090-024-10519-y

Ha An Quoc Than, Minh Anh Ngoc Tran, Duyen Ky Vo Nguyen, Trung Thanh Nguyen, Thien Huu Pham

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Abstract

Plasma agriculture is an emerging sector with potential to improve agricultural yield and promote sustainable development. While several studies have demonstrated positive impacts on seed germination and post-treatment plant growth indices, the response of vegetative stage plants to plasma-derived components remains underexplored. In this study, the effects of gaseous products generated by dielectric barrier discharge (DBD) plasma on the vegetative growth of mustard greens (Brassica juncea L.) were investigated. Fourteen-day-old plants were exposed to plasma gas (indirect plasma) at varying frequencies, and growth parameters were monitored after 7 and 14 days of treatment. The results revealed that exposure to plasma gas for 30–45 min per day positively impacted root length, plant height, leaf area as well new leaf formation rate, with increases ranging from 16 to 30%. Additionally, plasma-exposed plants exhibited significantly higher chlorophyll content (33%), total protein content (15–20%), and dry/fresh weight ratio (17%) compared to the control sample. Interestingly, cold plasma treatment demonstrated a greater influence on root growth, while a negative effect was observed on aboveground parts at high exposure frequencies. These findings demonstrate that plasma treatment not only benefits seed germination but also has the potential to enhance crop yield through its stimulatory effects on vegetative growth.

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气体等离子体放电对芥菜芽后生长的促进作用

等离子农业是一个具有提高农业产量和促进可持续发展潜力的新兴部门。虽然一些研究已经证明了对种子萌发和处理后植物生长指标的积极影响，但营养阶段植物对血浆源性成分的反应仍未得到充分研究。研究了介质阻挡放电（DBD）等离子体产生的气体产物对芥菜（Brassica juncea L.）营养生长的影响。将14日龄植株以不同频率暴露于等离子体气体（间接等离子体）中，并在处理7天和14天后监测其生长参数。结果表明，每天暴露30 ~ 45 min对根长、株高、叶面积和新叶形成率有显著的正向影响，增加幅度在16% ~ 30%之间。此外，与对照相比，血浆暴露植株的叶绿素含量（33%）、总蛋白质含量（15-20%）和干鲜比（17%）显著提高。有趣的是，冷等离子体处理对根系生长的影响更大，而高暴露频率对地上部分的影响则是负面的。这些发现表明，等离子体处理不仅有利于种子萌发，而且通过其对营养生长的刺激作用有可能提高作物产量。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.