Photoemission Study of GaN Passivation Layers and Band Alignment at GaInP(100) Heterointerfaces.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-29 Epub Date: 2025-01-14 DOI:10.1021/acsami.4c17453
Sahar Shekarabi, Mohammad Amin Zare Pour, Haoqing Su, Wentao Zhang, Chengxing He, Kai Daniel Hanke, Oleksandr Romanyuk, Agnieszka Paszuk, Wolfram Jaegermann, Shu Hu, Thomas Hannappel
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Abstract

To date, III-V semiconductor-based tandem devices with GaInP top photoabsorbers show the highest solar-to-electricity or solar-to-fuel conversion efficiencies. In photoelectrochemical (PEC) cells, however, III-V semiconductors are sensitive, in terms of photochemical stability and, therefore, require suitable functional layers for electronic and chemical passivation. GaN films are discussed as promising options for this purpose. The band alignment between such a protection layer and the III-V semiconductor should be aligned to minimize corrosion and nonradiative interfacial recombination and to promote selective charge carrier transport. Here, we investigate the band alignment between GaN passivation layers and n-type doped GaInP(100) photoabsorbers and grew n-type GaInP(100) epitaxially by metalorganic vapor phase epitaxy on oxidized GaAs(100) substrates to mimic a realistic preparation sequence. We prepared 1-20 nm GaN films on top employing atomic layer deposition and studied the band alignment at the GaN/GaInP(100) heterointerface by X-ray and ultraviolet photoelectron spectroscopy. Due to the limited emission depth of photoelectrons, we determined the band alignment by a series of measurements, in which we increased the thickness of the GaN films successively. The n-GaInP(100) surfaces, prepared with a well-known phosphorus-terminated p(2 × 2)/c(4 × 2) reconstruction, show an upward surface band bending (BB) of 0.38 eV and a Fermi level pinning due to the present surface states. Upon oxidation, the surface states are partially passivated, resulting in a reduction of the BB to 0.16 eV and a valence band offset (VBO) between the GaInP(100) and the thin oxide layer of 2.01 eV. Applying Kraut's approach, we identified a VBO of 1.90 eV and a conduction band offset of 0.44 eV between GaInP(100) with a thin oxide layer and the GaN passivation layer. We conclude that the GaN is a well-suited passivation layer for PEC cells and facilitates selective transport of photogenerated electrons.

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GaN钝化层的光发射研究及GaInP(100)异质界面的能带对准。
迄今为止,具有GaInP顶部光吸收器的III-V型半导体串联器件显示出最高的太阳能-电力或太阳能-燃料转换效率。然而,在光电化学(PEC)电池中,III-V半导体在光化学稳定性方面是敏感的,因此需要合适的功能层来进行电子和化学钝化。本文讨论了氮化镓薄膜作为实现这一目的的有前途的选择。这样的保护层和III-V半导体之间的能带排列应该对齐,以减少腐蚀和非辐射界面复合,并促进选择性电荷载流子输运。在这里,我们研究了GaN钝化层和n型掺杂GaInP(100)光吸收剂之间的能带对准,并通过金属有机气相外延在氧化的GaAs(100)衬底上生长n型GaInP(100),以模拟真实的制备过程。采用原子层沉积的方法制备了1 ~ 20 nm的GaN薄膜,并利用x射线和紫外光电子能谱研究了GaN/GaInP(100)异质界面处的能带排列。由于光电子的发射深度有限,我们通过一系列的测量来确定带对准,其中我们陆续增加了GaN薄膜的厚度。n-GaInP(100)表面,通过众所周知的磷端p(2 × 2)/c(4 × 2)重构,显示出0.38 eV的向上表面能带弯曲(BB)和由于当前表面状态导致的费米能级钉住。氧化后,表面态部分钝化,导致BB降至0.16 eV, GaInP(100)与薄氧化层之间的价带偏移(VBO)为2.01 eV。应用Kraut的方法,我们确定了具有薄氧化层的GaInP(100)和GaN钝化层之间的VBO为1.90 eV和导带偏移为0.44 eV。我们得出的结论是,氮化镓是一个非常适合的钝化层的PEC细胞,并促进了光生电子的选择性传输。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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