Approaching Upper Bounds to Resonant Nonlinear Optical Susceptibilities with Inverse-Designed Quantum Wells

IF 6.5 1区 物理与天体物理 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Photonics Pub Date : 2025-01-21 DOI:10.1021/acsphotonics.4c01892
Hao Li, Theodoros T. Koutserimpas, Francesco Monticone, Owen D. Miller
{"title":"Approaching Upper Bounds to Resonant Nonlinear Optical Susceptibilities with Inverse-Designed Quantum Wells","authors":"Hao Li, Theodoros T. Koutserimpas, Francesco Monticone, Owen D. Miller","doi":"10.1021/acsphotonics.4c01892","DOIUrl":null,"url":null,"abstract":"We develop a unified framework for identifying bounds to maximum resonant nonlinear optical susceptibilities and for “inverse designing” quantum-well structures that can approach such bounds. In special cases (e.g., second-harmonic generation) we observe that known bounds, a variety of optimal design techniques, and previous experimental measurements nearly coincide. But for many cases (e.g., second-order sum-frequency generation, third-order processes), there is a sizable gap between the known bounds and previous optimal designs. We sharpen the bounds and use our inverse-design approach across a variety of cases, showing in each one that the inverse-designed QWs can closely approach the bounds. This framework allows for comprehensive understanding of maximum resonant nonlinearities, offering theoretical guidance for materials discovery as well as targets for computational design.","PeriodicalId":23,"journal":{"name":"ACS Photonics","volume":"29 1","pages":""},"PeriodicalIF":6.5000,"publicationDate":"2025-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Photonics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1021/acsphotonics.4c01892","RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

We develop a unified framework for identifying bounds to maximum resonant nonlinear optical susceptibilities and for “inverse designing” quantum-well structures that can approach such bounds. In special cases (e.g., second-harmonic generation) we observe that known bounds, a variety of optimal design techniques, and previous experimental measurements nearly coincide. But for many cases (e.g., second-order sum-frequency generation, third-order processes), there is a sizable gap between the known bounds and previous optimal designs. We sharpen the bounds and use our inverse-design approach across a variety of cases, showing in each one that the inverse-designed QWs can closely approach the bounds. This framework allows for comprehensive understanding of maximum resonant nonlinearities, offering theoretical guidance for materials discovery as well as targets for computational design.

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用反设计量子阱逼近共振非线性光学磁化率的上界
我们开发了一个统一的框架来识别最大共振非线性光学敏感性的界限和“逆设计”量子阱结构,可以接近这样的界限。在特殊情况下(例如,二次谐波产生),我们观察到已知的界限,各种优化设计技术,和以前的实验测量几乎一致。但是对于许多情况(例如,二阶和频率生成,三阶过程),已知边界和以前的最优设计之间存在相当大的差距。我们在各种情况下锐化边界并使用我们的反设计方法,在每个情况下,反设计的qw都可以接近边界。该框架允许对最大共振非线性的全面理解,为材料发现以及计算设计目标提供理论指导。
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来源期刊
ACS Photonics
ACS Photonics NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
11.90
自引率
5.70%
发文量
438
审稿时长
2.3 months
期刊介绍: Published as soon as accepted and summarized in monthly issues, ACS Photonics will publish Research Articles, Letters, Perspectives, and Reviews, to encompass the full scope of published research in this field.
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